Dust-free chalk and making process

A production process and technology of chalk, which can be applied to pencil cores, household utensils, applications, etc., can solve the problem of chalk dust pollution and achieve clear handwriting

Inactive Publication Date: 2002-06-05
刘瑾
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of this invention is to provide a kind of dust-free chalk and manufacturing process that can effectively solve the dust pollution problem of existing chalk

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0015] Embodiment: prepare 100 white cylinder dust-free chalks, (each radius 1cm, height 10cm, net weight 50g), weigh 500g white oil in a beaker, weigh 2250g calcium carbonate, 1500g stearic acid, 750g titanium in addition White; put stearic acid into a stirring reaction device equipped with white oil, heat to make it miscible into a liquid state; add calcium carbonate and titanium dioxide, continue heating, and fully stir and mix to form a mixed slurry; the mixed slurry is mixed by a diaphragm metering pump The slurry is poured into the mold, left to cool until the mixed slurry is completely solidified, and the finished product can be packaged after demoulding.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to dust-free chalk and its making process. The material for the dust-free chalk consists of stuffing 40-50 weight portions, coloring agent 1-20 weight portions, adhesive30-35 weight portions and assistant 10-15 weight portions. The present invention has the following advantages: clear writing on available blackboard, no dust contaminatino to writer's fingers, face and clothing and no dust residuum on the blackboard after erasting with available blackboard eraser.

Description

technical field [0001] The invention belongs to the production of chalk, in particular to a dust-free chalk and its production process. Background technique [0002] The chalk used for teaching and writing for a long time is basically composed of calcium sulfate and calcium carbonate with fine particles and weak molecular binding force, so there will be dust pollution problems during use. Existing solutions have the disadvantages of poor dust suppression effect, dismantling and replacement of existing equipment, and additional costs in a wide range of applications. Contents of the invention [0003] The purpose of this invention is to provide a kind of dust-free chalk and its manufacturing process that can effectively solve the dust pollution problem of existing chalk. [0004] The technical contents of the present invention are: the raw materials and weight components of the dust-free chalk of the present invention are as follows: 40-50 parts of filler, 10-20 parts of co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09D13/00
Inventor 刘瑾
Owner 刘瑾
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap