Image sensor single-layer conductor rest secondary semi-etching mfg. method and packaging structure thereof
An image sensor and lead frame technology, which is applied in radiation control devices, semiconductor/solid-state device manufacturing, image communication, etc., can solve problems such as affecting the transmission of fine sensing signals, not easy to ensure good product quality, and difficult manufacturing processes. , to achieve the effect of avoiding the mechanical stamping production process, ideal practical effect, and quality assurance
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[0025] refer to Figure 1 to Figure 5 As shown, the present invention relates to a method for preparing a single-layer lead frame of an image sensor by secondary half-etching and its packaging structure.
[0026] Such as Figure 5 As shown, the structure of the image sensor of the present invention includes: a sensing chip 1, a single-layer lead frame 2 and a glass cover plate 4; the lead frame is provided with a chip holder 21 and several pins 22, each pin 22 is surrounded The periphery of the chip holder 21 is defined as an inner lead (inner lead) 221, which is used to connect the signal contact of the sensing chip 1, and the outer edge of each pin 22 extending to the lower edge of the package is defined as an outer lead (outlead) 222, which It is an SMT pin used for soldering an external printed circuit board to transmit electrical signals; the sensing chip 1 is pasted on the top surface of the chip holder 21, and the top surface of each internal pin 221 is connected with ...
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