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Method and apparatus for large area photoetching by constant light source step scanning

A step-scanning, large-area technology, applied in optics, optical components, optomechanical equipment, etc., can solve problems such as low resolution, high cost, and inapplicability, and achieve flexible and variable field of view, structure and control Easy to improve the effect of uniformity

Inactive Publication Date: 2004-06-09
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

At present, the MA-2400 lithography machine used by YANSEN (YANSEN AUTOMATIC TECHNOLOGY CO LTD) in Japan is used for lithography of samples larger than 12 inches. Weight: 800kg, maximum exposure area: 400mm×400mm, uniformity of illumination: ±6%, and resolution of 10μm. The system structure is complex, the development process is difficult, the cost is expensive, and it is not suitable for large-area photolithography

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  • Method and apparatus for large area photoetching by constant light source step scanning
  • Method and apparatus for large area photoetching by constant light source step scanning
  • Method and apparatus for large area photoetching by constant light source step scanning

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Embodiment Construction

[0017] Such as figure 1 As shown, the scanning unit is a small light source with high uniformity and constant power. It uses the light source to scan step by step, scan along the X direction, and step by step along the Y direction for splicing. One exposure is completed through multiple scans.

[0018] Such as figure 2 As shown, the scanning unit is a parallelogram, 1 is the scanning area, 2 is the scanning parallelogram unit, 3 is another scanning parallelogram unit, the scanning unit itself has high uniformity, and the step distance of each scan is D , the splicing parts 2 and 3 just compensate each other, and the power of the scanning unit is constant. In this way, the energy accumulation sum of any point in the area swept by the splicing part is equal to the energy accumulation sum of any point in the area swept by the unspliced ​​part 1. Scanning completes one exposure. In addition, the scanning process can be multi-speed uniform scanning, and the scanning speed can be ...

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Abstract

A method for realizing large areas of photoetching with a constant light source step scan is realized by utilizing light source step scan to scan along X direction and step and splice along Y direction, in which, the scan unit is of high uniformity, constant power and small light source, the shape of which is a parallelogram with a pair of acute angles smaller than 60 deg. The device is composed of a motor, a drive unit, a scan head, a slide way, and a frame, the motor axis is connected with the optical rod in the drive unit, the scan head is held on the slideway and applied with a closed loop switch to control the optical source, the device is fixed on the frame.

Description

technical field [0001] The invention relates to a method and a photolithography device for realizing large-area photolithography by step-scanning with a constant light source. Background technique [0002] In recent years, with the development of Micro Electro Mechanical System (MEMS), large-area microfabrication has been more and more widely used, and optical lithography is basically used. At present, the MA-2400 lithography machine used by YANSEN (YANSEN AUTOMATIC TECHNOLOGY CO LTD) in Japan is used for lithography of samples larger than 12 inches. Weight: 800kg, maximum exposure area: 400mm×400mm, uniformity of illumination: ±6%, and resolution of 10μm. The system structure is complicated, the development process is difficult, and the cost is expensive, so it is not suitable for large-area photolithography. Contents of the invention [0003] The object technical problem solving of the present invention is: provide a kind of constant light source step scanning to reali...

Claims

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Application Information

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IPC IPC(8): G02B26/10G03F7/22H01L21/027
Inventor 赵立新胡松王肇志陈兴俊
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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