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Composite plasma surface treatment apparatus

A surface treatment device and plasma technology, which are applied in metal material coating process, superimposed layer plating, coating, etc. Performance requirements and other issues, to achieve the effect of uniform processing, uniform distribution, and large operation space

Inactive Publication Date: 2005-04-06
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Practical applications show that it is difficult to meet complex surface performance requirements with a single treatment technology on the workpiece surface. For example, it is difficult to obtain a thick surface modification layer that resists heavy loads only by a single ion implantation. Therefore, the composite surface treatment technology for workpieces is subject to people pay more and more attention to

Method used

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  • Composite plasma surface treatment apparatus
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Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0006] Specific Embodiment 1: This embodiment is described in conjunction with Fig. 1 and Fig. 2. This embodiment consists of a vacuum device 1, a secondary vacuum device 6, a diffusion pump 2, a rotary vane pump 3, a pipeline 4, a first valve 7, and a second valve 5. Connector 8, cable 9, and power input device 10; the diffusion pump 2 is connected with the vacuum chamber 1-2 and the rotary vane pump 3 in the vacuum device 1 through the first valve 7, the pipeline 4 and the second valve 5, and the vacuum The upper cover 1-3 in the device 1 is connected with the secondary vacuum chamber 6-1 in the secondary vacuum device 6 through the connecting plate 8, and the described vacuum device 1 is composed of a vacuum chamber 1-2, an upper cover 1-3, a magnetic Controlled sputtering target 1-4, vacuum cathode arc 1-5, observation window 1-6, radio frequency antenna 1-7, sample stage 1-10, water inlet 1-11, water outlet 1-12, insulating sleeve 1-13 , seals 1-14; the upper end of the v...

specific Embodiment approach 2

[0007] Specific Embodiment 2: This embodiment is described in conjunction with FIG. 1. The secondary vacuum device 6 in this embodiment is composed of a secondary vacuum chamber 6-1, a flange 6-2, a sealing ring 6-3, and a cover plate 6-4. ; The upper end of the secondary vacuum chamber 6-1 is connected with a flange 6-2, the upper end of the flange 6-2 is equipped with a cover plate 6-4, and a sealing ring 6-3 is installed in the inner hole of the cover plate 6-4 , the other components and connections are the same as those in Embodiment 1.

specific Embodiment approach 3

[0008] Specific Embodiment Three: This embodiment is described in conjunction with FIG. 1. The power input device 10 in this embodiment is composed of a motor 10-3, an insulator 10-4, a center electrode 10-1, and a brush 10-2; the motor 10-3 It is connected with the center electrode 10-1 through the insulator 10-4, the brush 10-2 is installed on the center electrode 10-1, the motor 10-3 is seated on the support 11, and other components and connections are the same as the first embodiment.

[0009] Specific Embodiment Four: This embodiment is described in conjunction with Fig. 1. The cable 9 in this embodiment is composed of a high-voltage cable 9-1, a high-voltage pulse cable 9-2, and a low-voltage pulse cable 9-3; the high-voltage cable 9-1 passes through the switch 12 It is connected with the high-voltage pulse cable 9-2 or the low-voltage pulse cable 9-3, and other components and connection relations are the same as those of the first embodiment.

[0010] Embodiment 5: This...

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Abstract

Compound plasma surface treatment installment. The invention involves a kind of work piece surface treatment installment. The proliferation pumps (2) (4) (1-2) and turns on lathe the piece through the pipeline with the vacuum chamber to pump (3) to connect, the vacuum chamber 1-2 top head 1-3 and two levels of vacuum chambers (6-1) connect, vacuum chamber (1-2) on the sidewall is equipped with the observation window (1-6), vacuum chamber (1-2) on the sidewall is loaded with the magnetism to control the sputtering target (1-4) the vacuum negative pole arc (1-5), the vacuum chamber (1-2) the cavity is loaded with the radio frequency antenna (1-7) and sample (1-10), sample (1-10) (10-1) connects with the central electrode, Central electrode (10-1) with vacuum chamber (1-2) between the foundation is loaded with insulating cover (1-13), insulating cover (1-13) (10-1) between is loaded with the seal with the central electrode (1-14), the central electrode (10-1) on electronics brush (10-2) (9-1) connects with the high tension cable. The installment through produces the many kinds of granules to cause the work piece surface to obtain the thicker membrane level and the membrane level diversification. The installment uses in the work piece surface compound plasma to process.

Description

Technical field: [0001] The invention relates to a workpiece surface treatment device, in particular to a composite plasma surface treatment device. Background technique: [0002] With the development of industry, people have put forward higher and higher requirements for the performance of the surface of industrial parts, so the surface modification technology of the workpiece has received more and more attention, such as ion implantation, nitriding, sputtering deposition, cathode arc injection deposition, etc. Practical applications show that it is difficult to meet complex surface performance requirements with a single treatment technology on the workpiece surface. For example, it is difficult to obtain a thick surface modification layer that resists heavy loads only by a single ion implantation. Therefore, the composite surface treatment technology for workpieces is subject to People pay more and more attention to it. Invention content: [0003] The object of the pre...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/00
Inventor 田修波崔江涛杨士勤
Owner HARBIN INST OF TECH