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Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body

A technology of substrate processing device and processing liquid, which is applied in the directions of spraying device, spraying device, and device for coating liquid on the surface, etc., can solve the problems of relative air mixing, etc., and achieve the effect of improving fluidity

Active Publication Date: 2005-05-25
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0027] In addition, the inventions described in Patent Document 3 to Patent Document 5 do not aim at solving the above-mentioned problems with respect to air mixing.

Method used

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  • Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body
  • Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body
  • Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body

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Embodiment Construction

[0074] (first embodiment)

[0075] (overall composition)

[0076] FIG. 1 is a perspective view showing a substrate processing apparatus 1 according to a first embodiment of the present invention. figure 2 It is a view showing main components of a resist liquid coating operation while showing a side cross section of the main body 2 of the substrate processing apparatus 1 .

[0077] The substrate processing apparatus 1 is roughly divided into a main body 2 and a control system 6. A square glass substrate used for manufacturing a screen panel of a liquid crystal display device is used as a substrate to be processed (hereinafter simply referred to as a "substrate") 90, and is formed on the substrate by selective etching. In the process of forming the electrode layer on the surface of the substrate 90, etc., it is configured as a coating processing apparatus for coating a resist liquid as a processing liquid on the surface of the substrate 90. Therefore, in this embodiment, the s...

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Abstract

PROBLEM TO BE SOLVED: To provide a slit nozzle capable of extracting the air of a manifold simply and certainly to prevent the occurrence of coating irregularity, and a coating treatment apparatus having the same. SOLUTION: The slit nozzle 41 has supply ports 46a and 46b of a resist liquid provided to both side end parts thereof and the manifold 45 is formed so that the upper surface 45a thereof has an inclination between the end part 47a of an air venting hole 47 and the supply ports 46a and 46b. By this shape of the manifold 45, air bubbles included in the filled resist liquid can be easily drawn out of the air venting hole 47. Further, since the resist liquid flows to the air venting hole 47 from the supply ports 46a and 46b, the stagnation of the resist liquid is not caused and air is vented certainly for a short time at the time of filling. Furthermore, since no local difference is caused in the viscosity of the resist liquid when coating treatment, a uniform coating film can be formed. COPYRIGHT: (C)2005,JPO&NCIPI

Description

technical field [0001] The present invention relates to a coating process in which a treatment liquid is mainly applied to the surface of various substrates such as glass substrates for liquid crystals, semiconductor wafers, flexible substrates for thin-film liquid crystals, substrates for photomasks, and substrates for color filters. substrate processing equipment. Background technique [0002] As a coating treatment device for coating the surface of various substrates such as glass substrates for liquid crystals, semiconductor wafers, flexible substrates for thin-film liquid crystals, substrates for photomasks, substrates for color filters, etc. , a slit coater that performs slit coating using a slit nozzle having a slit-shaped discharge portion, and a slit and spin coater that performs spin coating after performing slit coating. [0003] In the slit nozzle of such a coating processing apparatus, gas (mainly air) may be mixed into the processing liquid such as photoresist...

Claims

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Application Information

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IPC IPC(8): G03F7/16B05C5/02B05C11/00B05C11/10H01L21/027H01L21/31
CPCB05B1/30B05C11/1005B05D1/025G03F7/16H01L21/6715
Inventor 高木善则
Owner DAINIPPON SCREEN MTG CO LTD
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