Method for manufacturing semiconductor laser element
一种制造方法、半导体的技术,应用在半导体激光器、激光器、光波导半导体的结构等方向,能够解决不能防止热辐射特性、劣化、难以改善运行性能等问题,达到高成品率、提高成品率、降低元件电阻的效果
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[0045] Preferred embodiments of the present invention are described below with reference to the accompanying drawings.
[0046] figure 1 To show a cross-sectional view of a semiconductor laser element 30 manufactured by the semiconductor laser element manufacturing method according to the first embodiment of the present invention. This semiconductor laser element 30 is constructed so that a laser beam can be emitted when a current flows in a forward direction and is used for example in an optical pickup tube. This semiconductor laser element 30 includes a compound semiconductor multilayer structure 31 , a current blocking layer 32 , an n-type electrode 33 , a p-type electrode 34 and a gold overlaid layer 35 .
[0047] The compound semiconductor multilayer structure 31 is structured such that the first buffer layer 37, the second buffer layer 38, the first cladding layer 39, the active layer 40, the second cladding layer 41, and the etching stopper layer 42 provided with the ...
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Abstract
Description
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