106results about How to "Uneven thickness" patented technology

The invention relates to mullite crystal whisker mullite compounding coating layer that the manufacture method includes the following steps: coating the mixture slime of silica sol, aluminum sol and mullite slime in vacuum of the basal material, or coating orderly, under the catalyzing effect of metal fluoride mineralizer, sintering by high temperature. The invention is simple structure, low cost of raw material, acid proof, alkali proof, etc. it could improve the intension of the material and prolong the use life.

A printed material (5) has a transparent base member (51), a first image layer (52) formed on the base member, an intermediate layer (53) formed on the first image layer, and a second image layer (54) formed on the intermediate layer. The intermediate layer has a lower white background layer (531) positioned above the first image layer, a light blocking layer (532) positioned above the lower white background layer, and an upper white background layer (533) positioned above the light blocking layer. In the printed material, a thickness of the light blocking layer is uneven in conformity with undulation of the first image layer, and therefore a surface of the intermediate layer which is in contact with the second image layer is flat. With this structure, it is possible to prevent or suppress the undulation of the first image layer from appearing in the second image layer.

A piezoelectric resonator includes a substrate, an acoustic mirror formed on the substrate and includes alternately stacked first acoustic mirror material layers and second acoustic mirror material layers having higher acoustic impedance than that of the first acoustic mirror material layers, a piezoelectric film formed on the acoustic mirror, a top electrode formed on the piezoelectric film and a bottom electrode formed below the piezoelectric film. A bonding interface is provided between metal films bonded to each other between the substrate and the piezoelectric film.

The present invention discloses a method and apparatus for measuring the temperature field on the surface of casting billet/slab, including: a thermal imager, an infrared radiation thermometer, a mechanical scanning unit, an image and data processing system; the thermal imager, the infrared radiation thermometer and the mechanical scanning unit are respectively connected to the image and data processing system; the infrared radiation thermometer is installed on the mechanical scanning unit and can measure the temperature of casting billet/slab surface by scanning; the thermal imager can measure the temperature of a certain area on the surface of casting billet/slab by thermal imaging. The present invention makes use of the combination of high-resolution thermal imager and scan-type infrared radiation thermometer, through the model-based filtering method, overcomes the influence of iron scales on the surface of casting billet/slab, and implements real-time stable measurement of surface temperature of casting billet/slab.

A membrane module is made by inserting ends of membranes into a container and injecting resin directly into a space between adjacent membranes. The container may be a header shell having ducts for injecting the resin from outside of the header to the space between the adjacent membranes. The ducts may pass through a part of the header which forms a permeate cavity. The permeate cavity may be filled with a fugitive material while the resin is being injected.

A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.

Provided is a hybrid silicon wafer in which molten state polycrystalline silicon and solid state single-crystal silicon are mutually integrated, comprising fine crystals having an average crystal grain size of 8 mm or less at a polycrystalline portion within 10 mm from a boundary with a single-crystal portion. Additionally provided is a method of manufacturing a hybrid silicon wafer, wherein a columnar single-crystal silicon ingot is sent in a mold in advance, molten silicon is cast around and integrated with the single-crystal ingot to prepare an ingot complex of single-crystal silicon and polycrystalline silicon, and a wafer shape is cut out therefrom. The provided hybrid silicon wafer comprises the functions of both a polycrystalline silicon wafer and a single-crystal wafer.

A packaging substrate structure includes a dielectric layer with a plurality of dielectric pillars disposed on a portion of a large-dimension opening area of the dielectric layer; and a first circuit layer with a plurality of first circuits disposed on a portion of the dielectric layer, and a conductive block disposed in the large-dimension opening area of the dielectric layer having the dielectric pillars. The dielectric pillars reduce the difference of the electrical current density distribution between the large-dimension opening area and small-dimension opening areas during electroplating, thereby overcoming the conventional drawback of insufficient thickness or a hollow center of the conductive block that results in an uneven thickness of the circuit layer. The invention further provides a method of manufacturing the packaging substrate structure.

The invention relates to an extrusion coating head and a coating machine thereof. The extrusion coating head comprises an upper lip of an extrusion head and a lower lip of the extrusion head, wherein an extrusion passage is arranged between the upper lip of the extrusion head and the lower lip of the extrusion head, the extrusion passage is communicated with a storage cavity which is arranged in the lower lip of the extrusion head, a feeding passage and a return passage are also arranged in the lower lip of the extrusion head, and the feeding passage and the return passage are respectively communicated with the storage cavity; when the extrusion coating head is in coating, the return passage is closed, an upper extrusion surface which is arranged on the upper lip of the extrusion head in the extrusion passage can be inclined upwards, and air in the extrusion passage is discharged from a discharging opening of the extrusion passage along the upper extrusion surface. The air in the extrusion passage is discharged from the discharging opening of the extrusion passage, and the area of the cross section of the storage cavity is gradually reduced from middle part to two ends, so that a sizing agent is prevented from being blocked in the storage cavity; the discharging end of the lower lip of the extrusion head is provided with a protrusion part, so that the sizing agent is facilitated to be adhered onto a base material. The extrusion coating head and the coating machine thereof have the advantages of uniformity in coating, no exposure of foil, good coating effect, high production efficiency, high product quality and the like.

A dual view display structure and a method for producing the same are provided. First, a display panel is provided. Then, a patterned barrier layer is formed on a transparent substrate. The transparent substrate with the patterned barrier layer is attached to the display panel. Because there is a gap between the display panel and the patterned barrier layer, a liquid transparent material is injected into the gap to form a transparent material layer to fill the gap. The invention can not only increase the viewing angles of the dual view display, but also increase the production yield.

The invention relates to the technical field of coating metal films with protective films, and specifically relates to a vacuum coating method of a protective film. The vacuum coating method of the protective film comprises the following preparation steps of 1, vacuumizing, namely putting a product to be coated in a vacuum chamber, and then vacuumizing, and heating simultaneously so that water vapor is formed on the upper layer of a container; 2, plating a metal film, namely plating a metal film through an evaporative metal film coating process; 3, introducing air after finishing coating of the metal film, namely, turning off a diffusion pump, turning on a molecular grating, charging air into the vacuum chamber through a flowmeter and stabilizing the degree of vacuum and keeping for 0.2-1 minutes; 4, cleaning the surface of the metal film, namely starting an ion bombardment power source; and 5, plating the protective film, including charging liquid vapor of organic silicon, keeping the pressure unchanged, and starting the ion bombardment power source again so that the organic silicon grows on the metal film layer by layer to form the protective film. The vacuum coating method of the protective film has the characteristics of high production efficiency and low cost, and the protective film is good in compactness, strong in protection performance and wide in application range.

A curved liquid crystal display panel and a manufacturing method thereof are disclosed. The method includes a step of using a mask having a light-shielding portion to expose a color-filter photoresist layer, wherein the light-shielding portion is arranged in a position corresponding to an edge of the display panel; a step of developing the exposed color-filter photoresist layer, so that a concave portion corresponding to the position of the light-shielding portion is formed on the color-filter photoresist layer; and a step of forming photo spacers at a position corresponding to the concave portion of the color-filter photoresist layer on a substrate of the display panel.

The invention discloses coating equipment for preparing special coating glass fiber cloth. The coating equipment comprises a feeding machine, a controller, a dust remover, a coating mechanism, a light sensation drying machine and a winding machine. The controller is arranged on the front side of the feeding machine, and the controller is electrically connected with the feeding machine. The dust remover is arranged on the right side of the feeding machine, and the feeding machine is communicated with the dust remover. The coating mechanism is arranged on the right side of the dust remover, and the coating mechanism communicates with the dust remover. The light sensation drying machine is arranged on the right side of the coating mechanism. And the winding machine is arranged at the position corresponding to a discharging outlet, of the right side of the light sensation drying machine. According to the coating equipment for preparing the special coating glass fiber cloth, in the glass fiber cloth processing course, double-face synchronous coating can be conducted on the surface of the glass fiber cloth, the processing time is shortened, the processing efficiency is improved, and the problems that in the traditional glass fiber cloth coating process, coating dead corners exist, and the thickness of a coating on the surface of the glass fiber cloth is uneven are solved.

The invention relates to roll-welded pipe spiral electroplating equipment and an electroplating method thereof. In the roll-welded pipe spiral electroplating equipment, a roller is arranged in an electroplating tank, so that blank roll-welded pipes can be wound on the roller spirally to perform rolling electroplating. The roll-welded pipes are wound on the roller spirally to fulfill the aim that more blank roll-welded pipes are put into the electroplating tank with the same volume and are electroplated continuously, and the floor space of the electroplating equipment is reduced, and the cost of the equipment is saved while the electroplating efficiency is improved.

Provided is a process for producing a tinned copper wire. The process comprises subjecting a copper wire sequentially to activation treatment, a first hot tinning treatment, a first cooling, a second hot tinning treatment, and a second cooling to obtain a tinned copper wire. The first hot tinning treatment is carried out at a first temperature and the second hot tinning treatment is carried out at a second temperature. The first temperature is higher than the second temperature. The first temperature is at least 38° C. higher than the melting point of tin. The second temperature is at least 8° C. higher than the melting point of tin.

In forming a space layer of a multi-formation-layer recording medium, there are provided a medium having a high precision in a thickness of the space layer and its manufacturing process. In the multi-formation-layer recording medium wherein at least two pairs of an information recording layer and a translucency spacer are layered on a substrate having physical patterns composed of an optical spot groove and/or pits on the surface, an average thickness of the translucency spacers in an information zone is 15 μm or less, and a difference in spacer thickness between a minimum value and a maximum value is 2 μm or less.