The invention discloses a
copper plating tank. The
copper plating tank comprises a tank body, a spraying
pipe array arranged in the tank body,
anode hangers and an
anode array, wherein the tank body is used for accommodating an
electroplating solution and consists of a U-shaped tank body unit or a plurality of the U-shaped tank body units connected in sequence; the spraying
pipe array is provided with a plurality of spraying pipes arranged side by side, a plurality of spray nozzles for spraying a plating solution are arranged on the front surface of each of the spraying pipes in the height directions of the spraying pipes, and shielding grooves are formed in two side edges of the spraying pipes; the
anode hangers are used for supplying anode currents and comprise conductive flat plates arranged in the length direction of the U-shaped tank body unit; the anode array is provided with a plurality of anode monomers, anode strips immersed in the
electroplating solution are arranged at the lower parts of the anode monomers, and the left lateral edges and the right lateral edges of the anode strips are inserted into shielding grooves between every two adjacent spraying pipes. According to the
copper plating tank disclosed by the invention, the distribution of
electric power lines in the plating solution can be effectively improved, so that an edge effect is eliminated; the electric currents which do not exceed the upper limit of
current density can also be effectively supplied, so that the uniformity of a copper layer is improved, and the
electroplating efficiency is improved; the
copper plating tank is suitable for various printed circuit boards such as a back board, a base board, and a flexible board .