Copper and nickel preprocessing technology in ion implantation before polymer surface chemical plating

A technology of surface chemistry and ion implantation, applied in the field of nickel pretreatment and ion implantation of copper, can solve the problems of high activation cost of coating metal, waste of precious metals, serious environmental pollution, etc., achieve good appearance, improve bonding strength, and overcome unfavorable factors. Effect

Inactive Publication Date: 2007-04-25
CHINA UNIV OF MINING & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, electroless plating has the following disadvantages in a variety of polymer metallization technologies: First, when plating on a non-catalytic substrate, the substrate needs to be activated by adsorbing catalytic atoms on the surface
The above-mentioned pretreatment before electroless plating adopts implanted ions as precious metals, and the activation cost of the plating layer metal is high and wastes precious metals; the pretreatment process using electroless plating method before electroless plating has serious environmental pollution

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Embodiment 1: select polytetrafluoroethylene, clean the surface of polytetrafluoroethylene, degrease and remove the dirt attached to the surface; put the prepared polytetrafluoroethylene in the ion implantation equipment, connect the electrodes to polytetrafluoroethylene Vinyl fluoride material is used for ion implantation; the selected ion implantation element is copper, which is the same as the copper material for electroless plating; the implantation parameters are: accelerating voltage 15KV, implantation dose 2.25×10e 17 ions / cm 2 ; Place the injected polytetrafluoroethylene in the electroless plating solution for direct electroless copper plating. The electroless copper plating is a conventional electroless copper plating process in the prior art, omitted.

[0015] Combining the two technologies of ion implantation and electroless plating, ion implantation is used to replace the existing chemical pretreatment process in the sense of electroless plating to complete...

Embodiment 2

[0016] Example 2: polyethylene is selected, the selected ion implantation element is nickel, and the range of implantation parameters is: accelerating voltage 15KV, implantation dose 2.25×10e 17 ions / cm 2 ; Place the injected polyethylene material in the electroless plating solution for direct electroless nickel plating. Others are the same as in Embodiment 1, omitted.

Embodiment 3

[0017] Example 3: The selected ion implantation element is copper, which is different from the material iron in the subsequent electroless plating. The range of implantation parameters is: accelerating voltage is 45KV, implantation dose is 2.3×10e 17 ions / cm 2 ; Place the injected polytetrafluoroethylene in the electroless plating solution for direct electroless iron plating. Others are the same as in Embodiment 1, omitted.

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PUM

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Abstract

An ion implanted copper, nickel pretreatment process of before polymer surface chemical plating, belongs to pretreating process of polymer surface chemical plating. Adding high molecular polymer into ion implanter, adding electrode to the polymers, switching on the energy injecting switch of the ion implanter, with a accelerating voltage of 10 kV-45 kV, injected dose of 2*10e17-5*10e17ions / cm2. The method combines the ion implantation and chemical plating, adopts injecting metal ion different from or the same as the chemical coating metal, make full use of the advantages of chemical plating and ion implantation, thus creats a uniform coating with small porosity, good appearance, improves bonding tightness of the coating and substrate, has simple process and does not need repeated treatment; there is no plating liquid during the pretreatment Process, no secondary pollution; no noble metals injection, reduces costs, enhances self-catalysis in chemical plating, improves the plating efficiency.

Description

technical field [0001] The invention relates to a pretreatment process for copper plating on the polymer surface, in particular to an ion implantation copper and nickel pretreatment process before electroless plating on the polymer surface. Background technique [0002] Electroless plating is to use the reducing agent in the electroless plating solution to reduce metal ions to metal and deposit them on the surface of the substrate to form a coating. The obtained coating is uniform, has small porosity, good appearance, and the deep plating ability is 100%. The structure can be uniformly plated, so it has become a research hotspot in polymer metallization. However, electroless plating has the following disadvantages in various polymer metallization technologies: First, when plating on a non-catalytic substrate, the substrate needs to be activated by adsorbing catalytic atoms on the surface. However, the currently widely used sensitization-activation method needs to go through...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/48C23C18/20
Inventor 孙智王晓虹杨峰王振中
Owner CHINA UNIV OF MINING & TECH
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