Pattern correction device, pattern correction method and pattern correction assembly

A pattern and component technology, which is applied in the field of pattern correction components, can solve problems such as time-consuming, achieve the effect of shortening time, shortening standby time, and realizing the structure of the device

Inactive Publication Date: 2006-10-04
NTN CORP
View PDF2 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a problem that it takes time until the correction of the defective part is completed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pattern correction device, pattern correction method and pattern correction assembly
  • Pattern correction device, pattern correction method and pattern correction assembly
  • Pattern correction device, pattern correction method and pattern correction assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0161] Implementation form 1:

[0162] Fig. 1 is a diagram showing the overall structure of a pattern correction device according to Embodiment 1 of the present invention. In FIG. 1 , a pattern correction device 1 includes: an observation optical system 2 for observing the surface of a substrate; a monitor 3 for reflecting the observed image; and a cutting laser unit for irradiating laser light to the substrate through the observation optical system 2 to cut off unnecessary parts. 4. The coating mechanism part 5 that makes the correction liquid adhere to the tip of the coating needle to coat the defect part of the substrate; the substrate heating part 6 that heats the correction liquid applied to the defect part; image processing for identifying the defect part 7; a host computer 8 for controlling the entire device; and a control computer 9 for controlling the operation of the mechanism part of the device. In addition, there are also provided: an XY stage 10 for moving a subs...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to view more

Abstract

The present invention provides a device and a method of pattern correction capable of promptly correcting a defective part by simple structure. In a standby state, a tip part 19a of an application needle is immersed in correction fluid 17. At the time of application, when a cylinder part 20 drops a drive axis 20a, the application needle 19 projects from a hole 18b of a container 18. The correctionfluid 17a is adhered to the tip part 19a of the application needle. Next, an application cylinder 13 drops a drive shaft 13a, brings the tip part 19a of the application needle into contact with a defective part 22a of a substrate 22 and applies the correction fluid 17a to the defective part 22a. Consequently, a process for making the application needle go back and forth between the defective partand an ink tank as in the conventional manner is omitted.

Description

(1) Technical field [0001] The present invention relates to a pattern correcting device, a pattern correcting method and a pattern correcting component, in particular to a pattern correcting device, a pattern correcting method and a pattern correcting component for correcting a defect portion of a fine pattern formed on a substrate. More specifically, the present invention relates to the correction of open defects of electrodes, defects of ribs (partition walls) of plasma displays, deinking defects of liquid crystal color filters, defects of masks, etc., which occur in the manufacturing process of flat panel displays A pattern correction device, a pattern correction method, and a pattern correction component. (2) Background technology [0002] In recent years, with the increase in size and high definition of flat-panel displays such as plasma displays, liquid crystal displays, and EL displays, the chances of defects in electrodes or ribs on the substrate and defects in the c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B41J29/26B43L19/00G02F1/13G02F1/1335G09F9/00H01J9/50H01J11/22H01J11/34H01J11/36
CPCY02W30/82
Inventor 小池孝志松岛昌良
Owner NTN CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products