Treating liquid feed device
A technology for supplying devices and processing liquids, which is applied to cleaning methods using liquids, electrical components, semiconductor/solid-state device manufacturing, etc. It can solve problems such as leakage, improve processing efficiency, suppress leakage, and reduce processing costs.
Inactive Publication Date: 2010-04-21
FUTURE VISION
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Problems solved by technology
[0005] However, in the processing liquid supply device described in Patent Document 1, there is a problem that the width dimension (dimension in the direction perpendicular to the substrate conveyance direction) of the upper and lower housings is sufficiently long compared with the length dimension (dimension in the substrate conveyance direction). , and in the case of using a hydrophobic material (such as a synthetic resin material) as the material constituting the housing, etc., the processing liquid introduced into the substrate processing path between the upper and lower housings is drawn from the processing liquid supply side end of the upper and lower housings. part and the end part on the treatment liquid discharge side leaks to the outside
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[0033] The processing liquid supply device of the present invention is configured as follows: it is installed in the middle of a conveying path for conveying a substrate in a horizontal position, and the processing liquid is supplied countercurrently to the surface and back of the substrate from the upper and lower housings to the substrate being conveyed to perform predetermined processing, and The treatment liquid after treatment can be recovered through the upper and lower casings, that is, it is an improved device of the treatment liquid recovery type.
[0034] figure 1 Is an exploded perspective view showing an embodiment of the processing liquid supply device of the present invention, figure 2 It is a perspective view showing the assembly. In addition, image 3 Yes figure 2 A-A line cross-sectional view. In addition, in image 3 Inside the middle circle, the front upper wing 251 and the front lower wing 351 are enlarged and shown. Incidentally, these drawings are all so-...
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The invention provides a processing liquid feeder of a processing liquid recovery type which allows effective prevention of leakage of the processing liquid from the enclosure during processing of a substrate even when the upper and lower enclosures are made of a hydrophobic material and are long in both the width direction and the substrate-carrying direction. An upper wing 25 and a lower wing 35are arranged on each outside surface of upper and lower nozzle blocks 22 and 32 arranged in the upper and lower enclosures, respectively, so as to protrude in the substrate-carrying direction and allow the substrate B to pass through. The upper and lower wings 25 and 35 are located so that the distance between their opposing surfaces is shorter than that between the opposing surfaces of the upperbottom plate 21 and the lower top plate 34.
Description
Technical field [0001] The present invention relates to a liquid-saving processing liquid used for wet processing such as cleaning, etching, development, peeling, etc. of single-sheet substrates such as glass substrates for various purposes, including liquid crystal panels and other display panels Improvement of supply device. Background technique [0002] Conventionally, as described in Patent Document 1, a processing liquid (washing liquid) supply device known as a processing liquid recovery type is known. In this processing liquid supply device, a box-shaped upper housing and a lower housing are arranged opposite to each other, and a substrate processing path is formed between the upper and lower housings so that the substrate passes through the processing path. Then, the processing liquid is supplied to the substrate processing path from the downstream side of the upper and lower housings in the substrate conveying direction, and the processing liquid supplied for the substr...
Claims
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IPC IPC(8): B08B3/00H01L21/304
Inventor 竹市芳邦加藤博己村冈佑介
Owner FUTURE VISION