Substrate fixing clamp of magnetic sputtering instrument

A technology for fixing fixtures and substrates, which can be used in sputtering plating, semiconductor/solid-state device manufacturing, ion implantation plating, etc.

Inactive Publication Date: 2007-05-02
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But its disadvantages are: firstly, since the position of the small iron pieces fixing the substrate is immutable, and the positions of each small iron piece are far apart, for a substrate with a small area, multiple iron pieces cannot be used. to fix it
Only one of the iron pieces can be used to clamp the substrate, which will inevitably cause the substrate to be not firmly fixed. During the loading and unloading process of the substrate being sent into the reaction chamber, it will become loose due to vibration, or even fall, resulting in Experimental failure
Secondly, when fixed with an iron sheet, it will inevitably cover part of the surface of the substrate. For a small substrate, the area itself is not large, so there are not many parts that can be used for sputtering coating, resulting in certain problems. Waste, and it is not conducive to the test analysis after film preparation

Method used

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  • Substrate fixing clamp of magnetic sputtering instrument
  • Substrate fixing clamp of magnetic sputtering instrument
  • Substrate fixing clamp of magnetic sputtering instrument

Examples

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Embodiment Construction

[0014] Please refer to shown in Fig. 1~3, a kind of fixture that is used for magnetron sputtering instrument substrate comprises a cover sheet (20), and this cover sheet main body is rectangular, and material can be steely, and there are three on its one side. A square notch (21) is used to expose the surface of the substrate, with a through hole (22) at each end; a substrate support (40), which is circular and has two screw holes (41) inside, The hole pitch is consistent with that of the through holes on the cover; the substrate (30) is placed under the notch of the cover, and is fixed between the cover and the substrate support by screws (10). The substrate is sandwiched between the cover slip and substrate holder and secured with screws.

[0015] The working process of this fixing fixture is: at first the cover sheet (20) is placed on the substrate holder (40), the through hole (22) on the cover sheet (20) and the screw hole on the substrate holder (40) (41) align, and the...

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Abstract

This invention relates to a technique area of fixture, particularly a substrate fixture of magnetron sputtering equipment. The substrate that is used to fix magnetron sputtering equipment includes: A cover glass of which main body is rectangle, one side of it has three square gaps, each of two sides has a through hole; A substrate support, is round, of which interior has two screw holes, its hole spacing concords with the hole spacing of through hole that is in cover glass; Substrate is putted under emargination of cover glass, and it is fixed between cover glass and substrate support by screw.

Description

technical field [0001] The invention relates to the technical field of fixing fixtures, in particular to a substrate fixing fixture for a magnetron sputtering apparatus. Background technique [0002] In recent years, with the rapid development of semiconductor technology, various growth methods of semiconductor materials have emerged as the times require. Magnetron sputtering technology has been widely used as a simple method, low cost and fast semiconductor thin film growth technology. The substrate is the substrate for the growth of semiconductor thin film materials, usually a crystalline substance, such as silicon, gemstones, gallium arsenide, etc.; it can also be an amorphous substance, such as glass, organic substances. The substrate is generally in the form of a thin sheet, and it needs to be fixed on the heating furnace of the magnetron sputtering apparatus during the growth process of the material. [0003] The more common method for fixing the substrate now is: th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35H01L21/687
Inventor 王鹏陈诺夫尹志岗杨霏
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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