Photo mask board cleaning method

A mask and cleaning technology, applied in the field of cleaning large-scale photolithography masks for TFT-LCD industry, can solve problems such as defective products and production stagnation, and achieve the effect of preventing defective products and safe cleaning

Inactive Publication Date: 2007-07-11
SHANGHAI SVA LIQUID CRYSTAL DISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The photolithography mask is only cleaned regularly or returned to the manufacturer for processing, and the common defects of the product caused by the adhesion of foreign matter on the surface of the mask cannot be discovered in time, which may cause a large number of defective products, or cannot be processed in time, resulting in production failure. stagnation

Method used

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Embodiment Construction

[0014] The preferred embodiments of the present invention are given below to describe the technical solution of the present invention in detail.

[0015] Set up the photomask dust inspection device in the exposure device.

[0016] The set items include the scope of dust inspection (referring to the area, which can be set according to the actual area of ​​the mask, generally set as the effective area of ​​the pattern), the level of foreign particle size judgment (can be divided into A level and B level , the setting range is from 70μm to 240μm, which can be set according to the actual cleaning degree), alarm setting (set to alarm or not to alarm when A-level or B-level foreign matter is found), and dust inspection method (one exposure task Dust check before the start or after the end) setting. Print out the results of the inspection on dust-free paper.

[0017] Cleaning of photolithography mask when the dust inspection device alarms

[0018] After the dust inspection device ...

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Abstract

The invention relates to a method for cleaning the large photo-etching mask plate of TFT-LCD (film transistor-liquid crystal display), wherein it uses high-pressure air gun, polymer cleaning rod and industry cotton rod, acetone and water, to effectively clean the fine particles and stain on the face of plate. The inventive method can be used in cleaning room on-site, to utilize the dust checker in the exposure device, to real-time detect the particle condition on the face of plate, which will cause exposure pattern transfer.

Description

technical field [0001] The invention relates to a method for cleaning a large photolithographic reticle for TFT-LCD (thin film transistor-liquid crystal display) industry. Background technique [0002] In the TFT-LCD manufacturing industry, especially in the manufacturing of large-size liquid crystal panels, photolithography masks are key components in the photolithography process. Using ultraviolet light and a photolithographic mask to expose the pattern coated with photoresist (photosensitive resin) according to the designed pattern, the electronic device pattern on the photolithographic mask can be transferred to the substrate according to 1:1 or other ratios, Electronic devices are formed through processes such as developing, etching, and stripping. Defects in the photolithographic mask will cause defects in the product pattern after exposure and transfer, resulting in low reliability or low yield of the product. There are two types of defects in photolithography masks...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02B08B7/04
Inventor 谭智敏
Owner SHANGHAI SVA LIQUID CRYSTAL DISPLAY
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