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Lithographic apparatus and device manufacturing method

A technology of equipment and lithography projection, which is applied in micro-lithography exposure equipment, semiconductor/solid-state device manufacturing, optomechanical equipment, etc., can solve the problem of insignificant error and so on

Inactive Publication Date: 2010-12-08
ASML NETHERLANDS BV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the resulting error is not significant

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0046] Embodiments of the invention include, for example, methods and apparatus that can be used to reduce errors caused by movement of a substrate during pulses of a radiation system.

[0047] figure 1 A lithographic projection apparatus 1 according to a particular embodiment of the invention is schematically described, comprising:

[0048] A radiation system for providing a radiation beam (eg, having a structure capable of providing a radiation beam). In this particular example, the radiation system Ex, IL for providing the radiation beam PB (e.g. UV or EUV irradiation) also includes a radiation source LA;

[0049] A programmable patterning structure PPM, such as a programmable mirror array, is configured to apply a pattern to the radiation beam. Typically, the position of the programmable patterning structure is fixed relative to the projection system PL. However, it may alternatively be connected to a positioning structure for its precise positioning relative to the pro...

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PUM

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Abstract

Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.

Description

technical field [0001] The present invention relates to lithographic projection equipment and methods. Background technique [0002] The term "programmable patterning structure" as used herein should be broadly interpreted to mean any configurable or programmable structure or domain that can be used to impart a patterned cross-section to an incident radiation beam corresponding to the A pattern generated on a target portion; the terms "light valve" and "spatial light modulator" (SLM) may also be used herein. In general, such patterns correspond to specific functional layers in a device produced in a target portion such as an integrated circuit or other device (see below). Examples of such compositional structures include: [0003] —Programmable mirror array. An example of such a device is a matrix addressable surface with a viscoelastic control layer and a reflective layer. The basic principle of the device is that (for example) addressed areas of the reflective surface ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70725G03F7/70425G03F7/70358G03F7/70041G03F7/70291H01L21/0274
Inventor H·威瑟D·W·卡兰R·-H·穆尼格施米特R·B·韦纳J·T·G·M·范德文G·H·罗宾斯
Owner ASML NETHERLANDS BV
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