Direct writeTM system
a writetm system and material technology, applied in the direction of superimposed coating process, liquid/solution decomposition chemical coating, manufacturing tools, etc., can solve the problem of limiting the variety of materials which may be deposited, so as to achieve the effect of enhancing deposition
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I. Direct Write™ Methods & Apparatus
[0045]FIG. 1 presents a a schematic view of one of the preferred embodiments of the Direct Write™ System, which comprises methods and apparatus for maskless, mesoscale deposition of a source material on a substrate. Unlike many previous deposition systems which are restricted to the formation of planar layers on a flat substrate, the present invention is capable of forming a wide variety of planar, non-planar, conformal or three-dimensional features on a substrate having virtually any profile or topography.
[0046] In one embodiment, the invention comprises a source of material 10 contained by an enclosure 11. Although the a preferred embodiment generally includes a source material in liquid form, the source may comprise any aggregation, mixture, suspension or other combination of any materials in any physical phase. The source of material 10 is contained in a vessel, pool, volume or chamber which is coupled to or in communication with an atomizer ...
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