Method for recycling/reclaiming a monitor wafer

US20060009011A1Inactive Publication Date: 2006-01-12TEXAS INSTR INC

Patent Information

Authority / Receiving Office
US ยท United States
Current Assignee / Owner
TEXAS INSTR INC
Publication Date
2006-01-12
Estimated Expiration
Not applicable ยท inactive patent

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Abstract

The present invention provides a method for recycling / reclaiming a monitor wafer and a method for testing a manufacturing process. The method for recycling / reclaiming the monitor wafer, among other steps, includes providing a monitor wafer having a number of front surface defects thereon (110), and annealing the monitor wafer in a presence of an inert gas to correct one or more of the number of front surface defects (150).
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Description

TECHNICAL FIELD OF THE INVENTION

[0001] The present invention is directed, in general, to a method for manufacturing an integrated circuit and, more specifically, to a method for recycling / reclaiming a monitor wafer used in the manufacture of an integrated circuit. BACKGROUND OF THE INVENTION

[0002] In practical semiconductor fabrication, hundreds and hundreds of individual manufacturing steps are required to convert a bare silicon wafer into one or more operational integrated circuits (ICs). In an effort to save time and money, after each individual manufacturing step is set up a monitor or test wafer is processed through the given manufacturing step to examine whether the manufacturing step achieves its intended purpose. If the specific manufacturing step being tested achieves its intended purpose, then the manufacturer is confident that actual device wafers may be subjected to the manufacturing step. However, if the specific manufacturing step being tested does not achieve its in...

Claims

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