Apparatus and exposure mask having cylindrical bending prevention member for forming a liquid crystal fence
a technology of liquid crystal fence and prevention member, which is applied in the direction of instruments, non-linear optics, optics, etc., can solve the problems of liquid crystal deterioration and damage to the alignment layer of the tft substrate, and achieve the effect of preventing deterioration of liquid crystal and alignment layer, and preventing an increase in temperatur
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[0031]FIG. 1 is a schematic view showing an apparatus for forming a liquid crystal fence according to an exemplary embodiment of the present invention. FIG. 2 is a plan view showing an assembled substrate shown in FIG. 1.
[0032] Referring to FIGS. 1 and 2, an apparatus 500 for forming a liquid crystal fence includes a base body 100, a light supply unit 200 and an exposure mask 300.
[0033] The base body 100 is provided with an assembled substrate 400. The assembled substrate 400 mounted on the base body 100 includes two substrates 410 and 420 and a spacer 450 disposed between the two substrates 410 and 420. The assembled substrate 400 is divided into at least one liquid crystal receiving area 430 and a liquid crystal fence area 440 surrounding the liquid crystal receiving area 430. The spacer 450 is formed at the liquid crystal fence area 440 and comprises a light-curable material cured by an exposure to a light 201.
[0034] As shown in FIG. 1, the light supply unit 200 is disposed on...
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