Process for deposition of crack-free and corrosion-resistant hard chromium and chromium alloy layers

a hard chromium alloy and crack-free technology, applied in the field of crack-free and corrosion-resistant hard chromium and chromium alloy layers and an electrolytic chromium plating composition, can solve problems such as cracks in layers, and achieve the effect of high current efficiency

Inactive Publication Date: 2007-06-14
ENTHONE INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009] Among the various aspects of the invention may be noted an electrolytic chromium plating composition and method for plating a chromium layer

Problems solved by technology

This process achieves current efficiencies of about 10% at a composition temperature of 70°

Method used

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Examples

Experimental program
Comparison scheme
Effect test

examples 1-10

Electrolytic Chromium Plating Compositions

[0029] Ten electrolytic chromium plating compositions were prepared including the additives of the present invention. Each composition was used to plate an alloy layer over an inductively hardened CK45 steel substrate. The base electrolytic composition (included in all 10 compositions) contained chromium(VI) oxide (CrO3) in a concentration of 280 g / L and sulfuric acid (H2SO4) in a concentration of 2.8 g / L. The steel substrates were plated at current of either 10A or 14A for 30 minutes, and the performance of the electrolytic plating compositions were measured in terms of current efficiency and deposition rate. The results are shown in the following table.

3-hydroxypropane-1-sulfonicHalogen oxoanionSulfonicCurrent DensityCurrentDeposition RateNo.acid (mL / L)concentration (g / L)acid (g / L)Current (A)(A / dm2)Efficiency (%)(μm / min)1800105037.31.39621020105037.071.3883103.40147036.76n.d.4123.40147038.79n.d.5820105040.231.5066820147037.332.010710201...

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Abstract

An electrolytic plating composition and related plating process where the composition comprises chromium ions, a mineral acid, halogen oxoanion, alkylsulfonic acid, and a source of sulfoacetic acid for electrolytically coating a surface of a substrate with a chromium layer or a chromium alloy layer.

Description

CROSS-REFERENCE TO RELATED APPLICATION [0001] This application claims priority to DE patent application 102005059367.4, filed Dec. 13, 2005. BACKGROUND OF THE INVENTION [0002] This invention relates to a process for the deposition of crack free and corrosion resistant hard chromium and chromium alloy layers and an electrolytic chromium plating composition for depositing chromium and chromium alloy layers. [0003] Surfaces are coated through electrolytic plating for a variety of reasons such as improving the surface properties in terms of hardness, abrasivity, and corrosion resistance. Additionally, surfaces can be coated for purely aesthetic reasons, such as in decorative coating. [0004] Chromium is a typical decorative and functional coating layer deposited by electrolytic plating methods. Adjusting the components and their concentrations in the electrolytic plating composition can affect chromium layer properties such as hardness, corrosion resistance, and brightness. [0005] Electr...

Claims

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Application Information

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IPC IPC(8): C25D3/04
CPCC25D3/10C25D3/04
Inventor HORSTHEMKE, HELMUTBENTELE, MATTHIAS KOLNER STRASSE 54 A
Owner ENTHONE INC
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