Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same

Active Publication Date: 2008-01-31
SAMSUNG DISPLAY CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0022]According to the above, a thin-film pattern having a multi-step may be formed using one mask so that a manufacturing efficiency is improved. Furthermore, a photoresist layer is exposed to light by using a mul

Problems solved by technology

However, when the slit optical mask is used, a residual photoresist layer corresponding to the slit portion is non-uniform.
Furthermore, a photoresist pattern having a relatively great width may not be formed using the s

Method used

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  • Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same
  • Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same
  • Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same

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[0031]The invention is described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity.

[0032]It will be understood that when an element or layer is referred to as being “on,”“connected to” or “coupled to” another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on,”“directly connected to” or “directly coupled to” another element or layer, there are no intervening e...

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Abstract

A multi-tone optical mask includes a substrate, a light-blocking pattern, a first semi-transmitting pattern and a second semi-transmitting pattern. The light-blocking pattern is formed on the substrate. The first semi-transmitting pattern is formed on the substrate. The second semi-transmitting pattern partially overlaps the first semi-transmitting pattern. The multi-tone optical mask has at least five different light-transmittances corresponding to a plurality of areas divided on the substrate.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application claims priority under 35 USC § 119 to Korean Patent Application No. 10-2006-71251 filed on Jul. 28, 2006, the contents of which are herein incorporated by reference in its entirety for all purpose.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to a multi-tone optical mask, a method of manufacturing the multi-tone optical mask and a method of manufacturing a thin-film transistor (TFT) substrate by using the multi-tone optical mask. More particularly, the present invention relates to a multi-tone optical mask capable of improving a manufacturing efficiency of a TFT substrate, a method of manufacturing the multi-tone optical mask and a method of manufacturing a TFT substrate by using the multi-tone optical mask.[0004]2. Description of the Related Art[0005]In general, a liquid crystal display (LCD) apparatus includes a flat display substrate. The display substrate includes a plur...

Claims

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Application Information

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IPC IPC(8): G03F1/00G02F1/1368G03F1/58H01L21/336H01L29/786
CPCG03F1/54G03F1/144G03F1/50G02F1/136
Inventor CHAI, CHONG-CHULYOON, SOON-WANKIM, SHI-YULYOUN, JOO-AE
Owner SAMSUNG DISPLAY CO LTD
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