Light-emitting gallium nitride-based III-V group compound semiconductor device and manufacturing method thereof
a gallium nitride and compound semiconductor technology, applied in the direction of semiconductor devices, basic electric elements, electrical apparatus, etc., can solve the problems of difficult transverse current spreading in the p-type semiconductor layer, great difference between external quantum efficiency and internal quantum efficiency of led, etc., to achieve the effect of increasing the brightness and light emitting efficiency of led
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[0019]Refer to FIG. 1A, a light-emitting gallium nitride-based III-V group compound semiconductor device 1 of the present invention includes a substrate 10, a n-type semiconductor layer 11, an active layer 13, a p-type semiconductor layer 14, a resistant and reflective layer 15, a conductive layer 16, a first electrode 17 and a second electrode 18. Refer to FIG. 1B, a manufacturing method of the light-emitting gallium nitride-based III-V group compound semiconductor device of the present invention consists of following steps:
[0020]Firstly, refer to step S10, provide a substrate 10 that is made from one of the following material: aluminum oxide (Al2O3), silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), aluminum nitride (AlN), gallium phosphide (GaP), silicon (Si), zinc oxide (ZnO), and manganese oxide (MnO), or their combinations. Then run the step S11, form the n-type semiconductor layer 11 over the substrate 10 and the semiconductor layer 11 is a n-type gallium...
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