EUV pod with fastening structure

a technology of reticles and fastenings, which is applied in the field of reticle pods, can solve the problems of unable to ensure the positioning status of the reticles in the inner container, and unable to determine whether the inner container is occupied, so as to prevent the cracking of the reticles

Active Publication Date: 2012-07-12
GUDENG PRECISION IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0015]By using the design provided by the present invention, when the inner container storing a reticle is introduced into the manufacturing process, the reticle inside can be monitored

Problems solved by technology

However, since any kind of dust (such as particles, powders, and organic matters) that adhere to the reticle can result in quality degradation of projected pattern, the reticle used to produce pattern on silicon wafers is required to be kept absolutely clean.
How

Method used

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  • EUV pod with fastening structure
  • EUV pod with fastening structure
  • EUV pod with fastening structure

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Embodiment Construction

[0024]As the present invention discloses a reticle pod, and more particularly, a reticle pod with fastening / retaining structure; the inner container, outer container, and the filtering material employed in the embodiments of reticle pod of the present invention are achieved by using current technologies and the description of which is thus omitted. Moreover, the drawings referred to in the following description are not made according to the actual scale and only function as illustrations demonstrating characteristics of the present inventions.

[0025]First, referring to FIG. 1, which is an explosive view of the reticle pod of the present invention. As shown in FIG. 1, the reticle pod comprises an outer container 1 and an inner container 2, wherein the outer container 1 comprises a lower cover of outer container 10 having a first inner surface 101 on which a plurality of first supporters 30 are formed, and an upper cover of outer container 12 having a second inner surface 121 on which ...

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Abstract

An EUV pod with fastening structure comprises an outer pod and an inner pod, wherein the upper cover of the inner pod is disposed with a plurality of retainers, and a plurality of supporters disposed on the outer pod of the EUV pod are used to press the plurality of retainers for the plurality of retainers to fasten and stabilize the reticle in the inner pod and thus ensure safety and stability of the reticle in the pod; by utilizing such design, risks of collisions of reticle in the pod due to vacillation of EUV pod during transportation can be reduced, and cost incurred by cracks and damages of reticles can also be greatly decreased.

Description

CROSS-REFERENCES TO RELATED APPLICATIONS[0001]This application claims priority to Taiwan Patent Application No. 100101022, filed Jan. 11, 2011, the contents of which are hereby incorporated by reference in their entirety.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention is related to a reticle pod, and more particularly, to an EUV pod with fastening structure.[0004]2. Description of the Prior Art[0005]In the rapidly developing modern semiconductor technology, optical lithography tool plays an important role. The pattern definition relies fully on optical lithography technology. In the application of optical lithography tool related to semiconductors, pre-designed circuit paths are fabricated as light-transparent reticle in specific form. Basing on the principle of exposure, after light from the light source passes through the reticle and is projected on a silicon wafer, specific circuit pattern can be exposed on the silicon wafer. However, since a...

Claims

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Application Information

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IPC IPC(8): B65D85/48
CPCG03F7/70741G03F1/66H01L21/67379H01L21/67772
Inventor KU, CHEN-WEILU, PAO-YILIN, CHIN-MINGSHENG, JAIN-PING
Owner GUDENG PRECISION IND CO LTD
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