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Variable wavelength interference filter, optical module, and optical analysis device

a filter and wavelength technology, applied in the field of variable wavelength interference filter, optical module, optical analysis device, can solve the problems of reducing the optical properties (transmittance and reflectance) of reflection films, affecting the accuracy of measurement, and affecting the accuracy of spectroscopic properties. achieve the effect of accurate measurement and high-quality measuremen

Inactive Publication Date: 2012-07-26
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The invention provides a variable wavelength interference filter with a simple structure that prevents reflection films from sticking to each other. This is achieved by providing a first multilayer stopper portion on one of the reflection films, which prevents the reflection films from contacting each other. Additionally, the invention provides a second multilayer stopper portion on the other reflection film, which further prevents the reflection films from sticking to each other. The first and second electrodes can be drive electrodes or electrostatic capacitance measuring electrodes. The invention simplifies the manufacturing process and reduces the size of the filter.

Problems solved by technology

While manufacturing such a variable wavelength interference filter, however, there is a risk that the reflection films may stick to each other when the substrates are bonded to each other.
Also, there is a risk that the reflection films may stick to each other when the gap is adjusted or due to an impact or the like when an external force is applied.
Such sticking of the reflection films causes damage to the surfaces of the reflection films and therefore lowers the optical properties (transmittance and reflectance) of the reflection films.
Therefore, there is a problem in that the configuration becomes complicated.
Generally, a reflection film deposited on a substrate has a problem in that an outer circumferential edge part thereof can be detached relatively easily and the reflection film deteriorates easily.
Generally, it is difficult to align two apertures having the same inner diameter dimension in such a manner that the inner diameter portions thereof match each other perfectly.

Method used

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  • Variable wavelength interference filter, optical module, and optical analysis device
  • Variable wavelength interference filter, optical module, and optical analysis device
  • Variable wavelength interference filter, optical module, and optical analysis device

Examples

Experimental program
Comparison scheme
Effect test

first embodiment

[0056]Hereinafter, a first embodiment of the invention will be described with reference to the drawings.

1. Schematic Configuration of Colorimeter Device

[0057]FIG. 1 is a block diagram showing a schematic configuration of a colorimeter device 1 (optical analysis device) according to this embodiment.

[0058]The colorimeter device 1 includes a light source device 2 which emits light to an inspection target A, a colorimetric sensor 3 (optical module), and a controller 4 which controls the overall operation of the colorimeter device 1, as shown in FIG. 1. In this colorimeter device 1, light emitted from the light source device 2 is reflected on the inspection target A and the reflected inspection target light is received by the colorimetric sensor 3. Based on a detection signal outputted from the colorimetric sensor 3, the chromaticity of the inspection target light, that is, the color of the inspection target A, is analyzed and measured.

2. Configuration of Light Source Device

[0059]The lig...

first modification

of First Embodiment

[0106]FIG. 5 is a partial sectional view showing parts of the etalon 5 according to a first modification of the first embodiment.

[0107]In the first embodiment, the first multilayer stopper portion 60 and the second multilayer stopper portion 70 are provided at positions that do not overlap each other, as viewed in the plan view of the etalon 5. However, as a modification of this, a configuration as shown in FIG. 5 may be employed. That is, the first multilayer stopper portion 60 and the second multilayer stopper portion 70 are provided at such positions that a portion of the first multilayer stopper portion 60 and a portion of the second multilayer stopper portion 70 overlap each other, as viewed in the plan view. The first multilayer stopper portion 60 and the second multilayer stopper portion 70 abut each other, thereby preventing the mirrors 54, 55 from contacting and sticking to each other.

[0108]Again, in such a configuration, the inner circumferential edge of...

second modification

of First Embodiment

[0112]FIG. 6 is a partial sectional view showing parts of the etalon 5 according to a second embodiment of the first embodiment.

[0113]The multilayer stopper portions 60, 70 in the first embodiment are configured with the mirrors 54, 55 and the electrodes 561, 562 stacked in this order from the substrates 51, 52. However, as a modification, the electrodes 561, 562 and the mirrors 54, 55 may be stacked in order from the substrates 51, 52, as shown in FIG. 6.

[0114]In the manufacturing process of the etalon5 with such a configuration, the mirrors 54, 55 are deposited after the electrodes 561, 562 are deposited. Therefore, the process of forming the mirrors 54, 55, which can easily be deteriorated in optical properties such as transmittance and reflectance by such factors as ambient temperature, can be shifted to a later stage, and damage to the mirrors 54, 55 during the manufacturing process can be prevented securely.

[0115]Also, for example, if the fixed mirror 54 is ...

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PUM

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Abstract

An etalon includes a first substrate, a second substrate facing the first substrate, a fixed mirror provided on a surface of the first substrate that faces the second substrate, a movable mirror provided on the second substrate and facing the fixed mirror via an inter-mirror gap, and a first electrode provided on the surface of the first substrate that faces the second substrate. A first multilayer stopper portion is provided by a portion of the first electrode being stacked with at least a portion of an outer circumferential edge of the fixed mirror.

Description

BACKGROUND[0001]1. Technical Field[0002]The present invention relates to a variable wavelength interference filter, an optical module including the variable wavelength interference filter, and an optical analysis device including the optical module.[0003]2. Related Art[0004]In the related art, a variable interference device (variable wavelength interference filter) is known in which reflection films face each other across a predetermined gap. The reflection films are arranged on surfaces of a pair of substrates that face each other (see, for example, JP-A-1-94312).[0005]In the variable wavelength interference filter described in JP-A-1-94312, electrodes for adjusting the gap are arranged to face each other by locating them on the surfaces of the pair of reflection films that face each other. As a drive voltage is applied to each electrode, the gap can be adjusted by electrostatic attraction. Thus, the variable wavelength interference filter only transmits light with a specific wavel...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G02B26/00
CPCG01J3/26G02B26/001G02B5/284G01J3/50
Inventor SANO, AKIRAMATSUNO, YASUSHIKITAHARA, KOJI
Owner SEIKO EPSON CORP