Retainer ring structure for chemical-mechanical polishing machine and method for manufacturing the same
a technology of chemical-mechanical polishing machine and retainer ring, which is applied in the manufacture of grinding machine components, metal working apparatus, manufacturing tools, etc., can solve the problems of multi-layer interconnection technology, low strength of retainer ring, and long time-consuming planarization, so as to reduce manufacturing costs, prevent contamination and corrosion of metallic ring, and improve durability
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[0021]Exemplary embodiments of the present invention will be described below in more detail with reference to the accompanying drawings. The present invention may, however, be embodied in different forms and should not be constructed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present invention to those skilled in the art. Throughout the disclosure, like reference numerals refer to like parts throughout the various figures and embodiments of the present invention.
[0022]Referring to FIG. 1, a retainer ring structure 10 according to an embodiment of the present invention will be described as follows.
[0023]A CMP machine includes a main body 108 and a polishing head 112. The main body 108 includes a polishing platen 110 mounted on the top surface thereof and a polishing pad 106 installed on the top surface of the polishing platen 110.
[0024]The polishin...
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