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Nano-fabrication system with cleaning system for cleaning a faceplate of a dispenser and method of cleaning the faceplate

a technology of a dispenser and a cleaning system, applied in the field of nanofabrication system, can solve the problems of needing to be cleaned, interfere with production,

Active Publication Date: 2021-10-14
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a method and system for cleaning a dispenser by using a light emitter and a vacuum apparatus. The light emitter is translated across the faceplate of the dispenser and emits light over its surface. The intensity of the light is measured at various points on the faceplate, and if there is any accumulated formable material (such as adhesive) at any point, a vacuum apparatus is used to remove it. This cleaning process ensures that the dispenser can dispense formable material accurately and efficiently. The technical effects of this patent include improved cleaning of the dispenser, improved accuracy and efficiency in dispensing formable material, and reduced downtime for maintenance.

Problems solved by technology

Eventually, the amount of accumulation can interfere with the production and needs to be cleaned.

Method used

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  • Nano-fabrication system with cleaning system for cleaning a faceplate of a dispenser and method of cleaning the faceplate
  • Nano-fabrication system with cleaning system for cleaning a faceplate of a dispenser and method of cleaning the faceplate
  • Nano-fabrication system with cleaning system for cleaning a faceplate of a dispenser and method of cleaning the faceplate

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Embodiment Construction

[0042]Throughout this disclosure, reference is made primarily to nanoimprint lithography, which uses the above-mentioned patterned template to impart a pattern onto formable liquid. However, as mentioned below, in an alternative embodiment, the template is featureless in which case a planar surface may be formed on the substrate. In such embodiments where a planar surface is formed, the formation process is referred to as planarization. Thus, throughout this disclosure, whenever nanoimprint lithography is mentioned, it should be understood that the same method is applicable to planarization. The term superstrate is used in place of the term template in instances where the template is featureless.

[0043]As noted above, the nano-fabrication technique involves dispensing the formable material from a dispenser onto the substrate. Over many dispensing cycles, the formable material may accumulate on a faceplate of the dispenser. Eventually, the amount of accumulation can interfere with the...

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Abstract

A method of cleaning a dispenser including a faceplate, comprises emitting light over the surface of the faceplate across the width of the faceplate, measuring an intensity of the light at a plurality of points on the surface of the faceplate after the light has passed over the width, determining, based on the measured light intensity, whether an amount of accumulated formable material on the faceplate is greater than a predetermined value, and in a case that the amount of accumulated formable material is greater than a predetermined value, imparting a suction force on the surface of the faceplate using the vacuum at a distance from the faceplate to remove at least a portion of the accumulated formable material from the surface of the faceplate.

Description

BACKGROUNDField of Art[0001]The present disclosure relates to a nano-fabrication system having a cleaning system for cleaning a faceplate of a dispenser and a method of cleaning the faceplate.Description of the Related Art[0002]Nano-fabrication includes the fabrication of very small structures that have features on the order of 100 nanometers or smaller. One application in which nano-fabrication has had a sizeable impact is in the fabrication of integrated circuits. The semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate. Improvements in nano-fabrication include providing greater process control and / or improving throughput while also allowing continued reduction of the minimum feature dimensions of the structures formed.[0003]One nano-fabrication technique in use today is commonly referred to as nanoimprint lithography. Nanoimprint lithography is useful in a variety of applications inclu...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03F7/00A47L9/28
CPCG03F7/0002A47L9/2815B08B5/04B08B13/00B41J2/16532B41J2/16579B41J2002/16582B05D3/12B05B15/52
Inventor CONE, CRAIG WILLIAMWENZEL, ROGER R.BATTIN, JASONDELLINGER, ANTOINEKONDO, HIROYUKI
Owner CANON KK