Processing system

Abstract

A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulating member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.

Description

[0001]This application is a division of U.S. patent application Ser. No. 10 / 278,863, filed Oct. 24, 2002, which is a reissue of U.S. Pat. No. 6,334,983, which resulted from U.S. patent application Ser. No. 09 / 402,393, filed Oct. 5, 1999, which was a 35 U.S.C. 371 National stage filing of PCT / JP / 98 / 0160<?delete-end id="DEL-S-00001" ?> <?insert-start id="INS-S-00002" date="20080101" ?>PCT / JP98 / 01610<?insert-end id="INS-S-00002" ?>, filed Apr. 8, 1998. <?insert-start id="INS-S-00003" date="20080101" ?>This application is one of three divisions of U.S. patent application Ser. No. 10 / 278,863, the other two divisions being U.S. patent application Ser. No. 10 / 463,439, filed Jun. 18, 2003, and U.S. patent application Ser. No. 11 / 055,788, filed Feb. 11, 2005.<?insert-end id="INS-S-00003" ?>TECHNICAL FIELD[0002]The present invention relates to a processing system, such as an etching system.BACKGROUND ART[0003]A prior art etching system is provided with an uppe...

AI Technical Summary

Benefits of technology

The present invention provides a novel and improved processing system with insulating members that can be easily attached, changed, and positioned in place. The insulating members are fitted in gas discharge holes of the upper electrode and are designed to easily be attached and changed. The insulating members are inserted into the gas discharge holes through the outlet ends, and the edges of the gas discharge holes are not exposed to the processing chamber, preventing etching by plasma. The insulating members have flanges that cover the rims of the gas discharge holes, extending the life of the upper electrode. The gas discharge holes are finished by a plasma-proofing process to prevent etching. The insulating members are made of a resin that has improved plasma resistance and can be extended the changing period. The processing system includes a processing vessel with an airtight processing chamber and upper and lower electrodes.

Problems solved by technology

Since the insulating members are made of alumina or a fluorocarbon resin, it is possible that particles of aluminum or the fluorocarbon resin are produced, and the particles adhere to the workpiece and exert adverse effects, such as the reduction of insulating strength, on the workpiece.

In this processing system, a plasma produced in a processing chamber flows through the gas discharge holes formed in the upper electrode member and the gas discharge holes of the cooling plate are damaged by the plasma.

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