The application discloses a
fast recovery power device with embedded
tunnel diode structure and a production method thereof, wherein the power device has a plurality of uniformly arrayed heavy doped regions with opposite doped types under a neutral
body region, and the heavy doped regions form a tunnel PN junction structure with the doped regions with opposite doped types in the neutral
body region; the tunnel PN junction structure can provide an additional minority
carrier leakage conduction channel when the
power MOSFET device is switched from a conducting state to a
closed state, reduces the
tail current when the device is closed, makes the power device quickly closed from an open state, and thus improves the working speed of the device and expands the
frequency band range of the power device. The application realizes the
fast recovery characteristic of the device through the process steps of adding the arrayed opposite heavy doped regions and
rapid thermal annealing, makes the power device have the advantages of low cost and
fast recovery, and breaks the barrier that the VDMOS power device can only be used in the medium and
low frequency field applications.