The utility model belongs to the technical field of
plasma deposition, and discloses an auxiliary device utilizing a
microwave deposition
plasma source, which comprises a
vacuum furnace body and an auxiliary
plasma source, the inner cavity of the
vacuum furnace body is cylindrical, a rotating stand for placing a workpiece is arranged in the
vacuum furnace body, the auxiliary plasma source is connected with the vacuum furnace body, and the rotating stand is connected with the vacuum furnace body. The auxiliary plasma source comprises a
waveguide tube, energy of the
waveguide tube is injected from the left side, the right side of the
waveguide tube is connected with the reflection matching network,
quartz glass for isolating the normal-pressure waveguide and the vacuum cavity is arranged above the waveguide tube, and perturbators for adjusting the size of the
microwave waveguide are arranged on the inner side of the waveguide tube and the position of a
quartz glass window. By arranging the auxiliary plasma source and the perturbator, the scattering proportion and the scattering direction of waveguide energy to the vacuum cavity can be increased, and the uniformity of the whole
coating can be ensured by matching with the rotating stand in the vacuum furnace body.