Incidence angle scanning ellipsometric imagery measurement method and apparatus
An incident angle, imaging measurement technology, applied in measurement devices, optical devices, instruments, etc., can solve problems such as limited degree, inability to have large contrast between sample substrate and film layer, etc.
Inactive Publication Date: 2008-02-20
INST OF MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology
In addition, in quantitative measurement at a single incident angle, even if the measurement sensitivity can be improved by changing the wavelength of light, the extent is limited
In the qualitative measurement at a single incident angle, the contrast between the sample substrate and the film layer cannot be maximized
Method used
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[0082] Referring to the accompanying drawing 1, a preferred system embodiment made by the present invention will be described in detail in combination with the ellipsometric imaging measurement method of the present invention.
[0083] The monochromatic light generating device 10 described in this embodiment is shown in Figure 3a: a monochromatic light scanning device composed of a wide-spectrum light source 100, a condenser lens 101, a monochromator 102 and an optical collimator 103, placed on the incident rotating arm 1 on the front end.
[0084] The polarizer 11 used in this embodiment is: a dichroic linear polarizer, the polarizer 11 is installed on the polarizer rotating table 12;
[0085] The used phase compensator of present embodiment is mica 1 / 4 wave plate, or quartz 1 / 4 wave plate, and it is installed on the phase compensator rotary table 14;
[0086] The monochromatic light generating device 10, the polarizer 11 installed in the polarizer rotating table 12, and the...
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The invention relates to a apparatus and method for incidence angle scan drift image, wherein incidence optical axial and emission optical axial intersect on a point of testing sample and form incidence surface; testing sample is vertical to incidence surface; optical devices of incidence and emission parts arranges coaxially on the specified optical axial; expand aligning, single color polarizing light beam of incidence parts illuminates on testing sample so as to modulate polarized light of incidence parts and emit reflecting light beam; the beam is modulated polarized again when it enters emission parts and images on the picture sensor to form picture electric signal; the electric signal enters into image processing and system controlling parts to get image gather, display and analysis processing; computer drives, controls and receives the feedback of system's motion units so as to do definitive or quantitative measurement to multi-parameter of nanometer film surface.
Description
technical field [0001] The invention relates to a qualitative or quantitative measurement of the refractive index and thickness of materials, in particular to an incident angle scanning ellipsometric imaging method and device for qualitative or quantitative measurement of bulk material surfaces or nano film materials. Background technique [0002] Nano-film materials with a geometric thickness of a few tenths of nanometers have been widely used in molecular biology, biochemistry, electrochemistry, materials science, microelectronics and other fields, and have become a hot spot of scientific research in recent years. At the same time, nano-film detection technology has also been developed rapidly, among which electron microscope, scanning force microscope and near-field optical microscope have been widely used. [0003] Electron microscopes use electron rays as detection light waves to scan and image objects, with a lateral resolution of less than 0.1 nanometers, as described...
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IPC IPC(8): G01B11/02G01N21/17
Inventor 靳刚孟永宏
Owner INST OF MECHANICS CHINESE ACAD OF SCI