Linear magnetic field sensor and its mfg. method
The technology of a magnetic field sensor and its manufacturing method is applied in the direction of the size/direction of the magnetic field, devices using electro-magnetic effects, and the manufacturing/processing of electromagnetic devices, which can solve the problems of complex preparation process, difficulty in ensuring product consistency, and increase in Problems such as the difficulty of sensor production, to achieve the effect of simplifying the preparation process and improving consistency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0014] Such as figure 2 As shown, the fabrication method of the junction linear magnetic field sensor: replace the mask in situ in the main sputtering chamber when depositing the non-magnetic layer, that is, use the mask to block the holes of the non-magnetic layer on the first and third tunnel junctions 1 and 3 during deposition. Sputtering causes the thickness of the nonmagnetic layer on the first and third tunnel junctions 1 and 3 to be thinner, and then removes the mask and sputters the rest of the tunnel junction materials.
[0015] Such as figure 1 As shown, the sensors with non-magnetic layers with different thicknesses prepared by the above method include: a film base and 4 tunnel junctions formed on the film base, wherein the first and third tunnel junctions 1 and 3 are exactly the same, and the first and third tunnel junctions are exactly the same. 2 and 4 tunnel junctions 2 and 4 are exactly the same, the thickness of the non-magnetic layer of the 1st and 3rd tunn...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 