Method for realizing water etching and rendering device

Abstract

This invention involves a method about graphics rendering technology, and the realization of open water etching, it including: Based on the pre-positioning of the preset settings, as well as the light source on the surface of the underwater scenes for rendering, access to the original images of underwater scenes; calculation the original image referred to in the bottom of each pixel relative to the light source referred to the depth of value, access to the depth of the bottom surface texture; described in depth in accordance with texture, respectively relative to the light source above the surface mesh in the number of vertices underwater scenes in the form of light, the light source referred to generate simulated underwater scene in the water formed by etching texture; water will be generated by the texture and etching described in the original image synthesis, generating results with water etching underwater scenes images. The present invention also opens corresponding rendering devices. its implementation of the program in achieving the water etching effects has good flexibility, and be able to achieve simulation point light source generated by the formation of water etching.

Description

technical field [0001] The invention relates to graphic rendering technology, in particular to a method for realizing water etching and a rendering device. Background technique [0002] When the light refracts from the curved water wave surface and enters the water, it will focus on certain areas on the light-receiving surface of the underwater object, forming water etching. How to simulate the effect of water etching in real time has become an unresolved issue in the field of graphics rendering technology. one of the problems to be solved. [0003] In the prior art, a reverse light transfer method is used to simulate the effect of water etching. A premise of this scheme is that it is assumed that only sunlight that is vertical to the bottom of the water can form water etching on the bottom of the water; the scheme includes the following process: [0004] S1. Render the underwater scene, and create an underwater grid vertically corresponding to the water surface grid; [0...

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Problems solved by technology

[0012] In the process of research and practice of the prior art, the inventor found that: when using the above-mentioned scheme to simulate the effect of water etching, the premise of realizing the scheme is to assume that only the sunlight perpendicular to the bottom of the water can form water etching on the bottom of the water. , so the number of vertices of the created underwater grid must be the same as the number of vertices of the water surface grid, so as to ensure that the vertices of the underwater grid can be traced vertically to the vertices of the water surface grid; according to this scheme, when the water surface is more complex , and when the underwater scene is relatively flat, if more water surface mesh vertices are set to ensure the expressiveness of the water surface, since there are correspondingly more underwater mesh vertices, the rendering of the underwater scene will include Many redundant vertices are processed, and if fewer underwater mesh vertices are set, the expressiveness of the water surface will be reduced; similarly, when the water surface is relatively simple and the underwater scene is more complicated, if fewer The water surface mesh vertices will reduce the expressiveness of the underwater scene, and if more underwater mesh vertices are set, the rendering of the water surface scene will also include the processing of many redundant vertices. Therefore, the flexibility of this scheme Poor; on the other hand, because the direction of the incident light is scattered when the vertically upward refracted light underwater is transmitted to the water surface in reverse, this scheme cannot simulate the water etching formed by the point light source

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