Method for preparing silica steam plating material

Abstract

A silica steam plating material preparation method is provided. Firstly, a cutting machine is used to precut a group of silica bars into short bars with the same length. And the short bars are cleaned and dried. Then, anaerobic glue adhesive is coated on a material plate. The group of silica bars is adhered to the material plate closely in parallel and is dried. Then, a group of cutting saws and a group of separators are arranged in intervals for every two and are fixed on a grinder spindle closely in parallel. And the material plate which is adhered with the silica bars is correspondingly fixed to a grinder operation table tightly and is cut into silica particles. At last, the silica particles are shoveled from the material plate, cleaned by boiled water and dried to form the silica steam plating material. The spacing of two adjacent cutting saws is arranged to be equal to the diameter of the silica bars. Therefore, with the method, the silica plating material with even and uniform structure can be made. Thus, the launching angle of steam during the evaporation is almost unchanged, the evaporation speed is even, the filming density is consistent and the yield is high.

Description

technical field [0001] The invention relates to a method for preparing silicon dioxide particles, in particular to a method for preparing a silicon dioxide vapor deposition material with uniform structure, which is used for preparing the silicon dioxide optical thin film vapor deposition material. Background technique [0002] Evaporated coating material is the starting material for preparing various optical films, and its shape and structure directly affect the compactness and refractive index uniformity of optical films. In the past, various evaporation materials were particles with irregular shapes and sizes. For example, such as figure 1 In the shown method, irregular quartz particles 8 (silicon dioxide particles) are placed in the evaporation crucible 9 of the vacuum chamber of the optical coating machine, and the electron gun filament 3 in the vacuum chamber emits electron beams 4 and irradiates on the quartz particles. Make it hot. When the temperature reaches the b...

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Problems solved by technology

[0003] Since the quartz particles of random size are placed in the evaporating crucible, these random quartz particles are heated by the electron beam, and the evaporation emission angle of the vaporized evaporated molecules will change continuously, so that the quartz molecules condensed on the substrate will produce different Uniform, resulting in a decline in yield;

[0004] Due to the rising state of evaporation of fused silica, the gaps between these irregular quartz particles are inconsistent, and the volume of large and small particles varies greatly, sometimes nearly 10 times, so the evaporation rate is very inconsistent, so the density is also inconsistent, which will affect Uniformity of film

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