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Stage drive method and stage apparatus, exposure apparatus, and device producing method

A technology of an exposure device and a driving method, which is applied in the field of stage drive, stage device, exposure device, and component manufacturing, and can solve the problems of reduced operation rate of the exposure device and the like

Active Publication Date: 2009-10-21
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, if the occurrence of water marks is serious, it is necessary to replace the front lens or optical components, but the time required for the replacement will become a factor that reduces the operating rate of the exposure device.

Method used

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  • Stage drive method and stage apparatus, exposure apparatus, and device producing method
  • Stage drive method and stage apparatus, exposure apparatus, and device producing method
  • Stage drive method and stage apparatus, exposure apparatus, and device producing method

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Embodiment Construction

[0158] The first embodiment:

[0159] Below, according to Figure 1 to Figure 10 A first embodiment of the present invention will be described.

[0160] exist figure 1 , showing a schematic configuration of the exposure apparatus 100 according to the first embodiment. The exposure apparatus 100 is a projection exposure apparatus of a step and scan method, that is, a so-called scanning stepper (also referred to as a scanner). The exposure apparatus 100 includes: an illumination system 10; a reticle stage RST for holding a reticle R used as a mask; a projection unit PU; The wafer stages WST1, WST2 used in the stage; off axis alignment (off axis alignment) systems ALG1, ALG2 as first and second mark detection systems; and control systems for these components. On wafer stages WST1 and WST2, wafers serving as substrates are placed. exist figure 1 , the wafer W1 is placed on the wafer stage WST1, and the wafer W2 is placed on the wafer stage WST2.

[0161] The aforementioned ...

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Abstract

When moving from the first state in which one stage (WST1 (or WST2)) is located in the first area directly below the projection optical system PL supplied with liquid Lq to another stage (WST2 (or WST1)) in the first area In the second state, the two stages are maintained in proximity in the X-axis direction and driven simultaneously in the X-axis direction. Therefore, it is possible to move from the first state to the second state in a state where liquid is supplied between the projection optical system and the specific stage located directly below the projection optical system. Thereby, the time from the end of the exposure operation on one stage to the start of the exposure operation on the other stage can be shortened, thereby enabling high-throughput processing. Furthermore, since the liquid can continue to exist on the image surface side of the projection optical system, it is possible to prevent water marks from occurring on the optical members on the image surface side of the projection optical system.

Description

Technical field [0001] The present invention relates to a stage driving method, a stage device, an exposure device, and a component manufacturing method. More specifically, the present invention relates to two devices capable of moving in a region including a first region in a two-dimensional plane in which a liquid is locally supplied. A stage driving method for driving a stage and a stage device suitable for implementing the stage driving method, an exposure device that supplies a liquid between a projection optical system and a substrate and exposes the substrate through the projection optical system and the liquid, and the use of Method for manufacturing elements of the exposure device. Background technique [0002] It is known that in the photolithography process for manufacturing electronic components such as semiconductor components (integrated circuits, etc.) and liquid crystal display components, a step and repeat type reduction projection exposure device (so-called...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
Inventor 柴崎祐一
Owner NIKON CORP