Sample carrier for focused ion beam microscope

A focused ion beam and microscope technology, applied to the parts of the particle separator tube, material analysis using the measurement of secondary emissions, etc., can solve the problems of sample damage and reduce the operable range of the sample

Inactive Publication Date: 2008-01-16
SHANGHAI HUA HONG NEC ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Copper glue, aluminum glue or carbon glue is usually used to fix the sample, but this will inevitably reduce the operable range of the sample, and sometimes the sample will be damaged due to certain operation errors due to the stickiness of the glue when removing the sample

Method used

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  • Sample carrier for focused ion beam microscope

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Experimental program
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Embodiment Construction

[0014] The present invention is applicable to two kinds of silicon wafer samples with conventional thicknesses of 0.73mm and 0.35mm.

[0015] As shown in FIGS. 1 and 2 , the carrier includes a metal base 1 and a platform 2 , the metal base 1 is a cylinder with a diameter of 3 mm and a height of 3 mm, and the metal base 1 supports the platform 2 . The height of the platform 2 is 1.5 mm, and a rectangular groove 4 with a depth of 1 mm is provided on the surface. At least one end surface of the rectangular groove is provided with an adjustable and movable fixed shaft 3. One end of the inner shaft of the rectangular groove 4 is connected to a metal gasket 5. The width of the metal gasket 5 is equal to the groove width.

[0016] When fixing the sample, first fix the metal base 1 on the standard sample stage, and then adjust the position of the metal spacer 5 in the rectangular groove 4 by adjusting the fixed shaft 3 to achieve the purpose of controlling the size of the rectangular ...

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Abstract

The invention discloses a sample carrier for the focusing ion beam microscope, which comprises a platform and a metal foundation which is used to support the platform. A rectangular groove is provided on the surface of the platform. At least one end surface of the rectangular groove is provided with adjustable and movable dead axes, one end of the dead axes is connected with the metal filling piece of a fixed sample. The invention can effectively avoid the damage to the sample when selecting the sample and the operational area of the sample can be increased.

Description

technical field [0001] The invention relates to the field of semiconductor failure analysis, in particular to a sample carrier for a focused ion beam microscope. Background technique [0002] Focus Ion Beam Microscope (FIB Focus Ion Beam Microscope) is an ion beam cutting and processing instrument. The traditional FIB has the function of cutting and making sample sections. At present, the focused ion beam microscope is widely used in the semiconductor electronics industry and the IC industry. Its main uses are: (1) Cutting and manufacturing of micro-sections of semiconductor chips; (2) Modification of chip electronic circuits; (3) Preparation of transmission electron microscope samples . [0003] FIB works by striking the sample with a heavy metal ion to effectively remove material in a controlled manner. It uses high-energy ions incident on solid samples, elastic or inelastic scattering with the atomic nucleus and extranuclear electrons of the sample, and excites the samp...

Claims

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Application Information

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IPC IPC(8): G01N23/22H01J49/02
Inventor 唐湧耀裘莺
Owner SHANGHAI HUA HONG NEC ELECTRONICS
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