Unlock instant, AI-driven research and patent intelligence for your innovation.

Electronic photo mask data management system and method used for semi-conductor manufacture automatization

A photomask and semiconductor technology, applied in the direction of electrical digital data processing, data processing applications, special data processing applications, etc., can solve the problems of users making negligent mistakes, to avoid confusion, improve data accuracy and product quality, The effect of reducing manual entry errors

Inactive Publication Date: 2008-05-21
HEJIAN TECH SUZHOU
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Next, in step S110, once the product recipe is updated, all historical data (both new and old) for photomask manufacturing will be stored under the selected product recipe, and users are likely to make inadvertent mistakes, e.g. downloading and using older versions of incorrect recipe data

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electronic photo mask data management system and method used for semi-conductor manufacture automatization
  • Electronic photo mask data management system and method used for semi-conductor manufacture automatization
  • Electronic photo mask data management system and method used for semi-conductor manufacture automatization

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0037] see figure 2 , the eFDMS for semiconductor manufacturing automation according to the first embodiment of the present invention includes a plurality of workstations 2, a plurality of web portals 4, 6 (including photomask yellow light entrance 4 / WAT entrance 6 / or photomask factory entrance) , one or more servers 20, a plurality of machines 18 and a main program 10 residing on one or more servers 20, figure 2 The operating mechanism can refer to the following description: after the Unix workstation 2 makes the photomask, the system will store the photomask data in the first database (MySQL) 12, and use the UI of the Unix workstation 2 to control the state of the product data ( Draft / Release / History). The data of the first database 12 will be periodically synchronized to the second database 14 (Microsoft SQL). In fact, if only one database can be used (such as canceling the first database 12 and directly writing to the second database 14Microsoft SQL), a better effect c...

no. 2 example

[0041] see Figure 4 , according to the second embodiment of the present invention, the method for implementing the eFDMS of the photolithography process of semiconductor manufacturing automation includes the following items:

[0042] 1. Data Management

[0043] Use a database interface language (such as Perl DBI). Perl DBI is a database independent interface for Perl. Perl DBI and the Perl programming language are standard APIs. DBI defines a set of parameters, variables and unified database interface, which can meet the needs of eFDMS. Perl is an acronym for Practical Extraction and Report Language. In addition, programming of eFDMS can be performed under UNIX environment.

[0044] First, in step S301, a plurality of data is stored at a first database (MySQL database) at a workstation (such as a photolithography workstation and a photomask manufacturing workstation) (using a UNIX system). Perl and DBI are used to record photomask manufacturing data into the first datab...

no. 3 example

[0056] see Figure 7 , according to a third embodiment of the present invention, the main program for implementing eFDMS includes a method for performing layer-by-layer accuracy verification of input process settings or for checking errors during data input. Applicable to the product publishing GUI, product discarding GUI, product retrieval GUI and product removal GUI, the foregoing method to ensure the correct input sequence is described as follows: First, in step S401, "read file" must be selected first , otherwise the system generates a prompt asking for a selection. Next, in step S402, a product must be selected in the read product list, otherwise the system generates a second prompt to require such an operation. Next, in step S403, choose to "publish" the product information or "discard" the product information, otherwise the system generates a third prompt to request such an operation.

[0057] In step S404, after selecting "publish", the product formula is transformed...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides a method and system for implementing an electronic frame data management system for semiconductor manufacturing automation including the following steps: data is transferred and stored into a first database, product recipe status of the mask-making data is inspected using a double check UI, the mask-making data via a web page is presented without manual searching, the web page having a desired selection, that is automatically obtained and displayed, is presented, queried results to send out directly is obtained and query capabilities are provided, a product recipe data in an output document format is provided, the data is replicated and stored at the first database to a second database configured at a server, historical record of the user is searched remotely, layer-by-layer accuracy verifications of the input process settings is performed, and only the latest information for the product recipe data is ensured for presentation.

Description

technical field [0001] The present invention generally relates to an electronic frame data management system (eFDMS), and more particularly, to an eFDMS system and method for semiconductor manufacturing automation. Background technique [0002] Over half a century, integrated circuit (IC) design has evolved from the invention of the first solid-state transistors to today's multi-million transistor circuits. Providing this remarkable advance in circuit design is the electronic design automation (EDA) industry. From the driving force of fierce competition to the adherence to Moore's Law, the EDA industry has provided a variety of technological innovations covering a large number of rules. From the invention of the hardware definition language (HDL) to the extension of the commercial life of semiconductor exposure systems, the EDA industry has continued to evolve to meet the growing demands of the semiconductor industry. Productivity, quality and efficiency have been the main...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06Q10/00G06Q50/00G06F17/50
CPCG03F1/14G03F1/68
Inventor 许喆彭明钧
Owner HEJIAN TECH SUZHOU