A preparation method of MgO film to enhance the statistics of PDP on discharge delay time
A thin film preparation and delay time technology, which is applied in the manufacture of discharge tubes/lamps, electrode system manufacture, circuits, etc., can solve the problems that the jitter time has an optimization effect that has not been specified in detail, and shorten the statistical discharge delay time. The effect of operating and controlling production costs
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Embodiment 1
[0023] As shown in Figures 1, 2, and 3.
[0024] First, the front and rear glass substrates 1, 2 of the shadow mask type color plasma display screen are placed on the working fixture 9 in the evaporation chamber 8 of the electron beam vacuum coating machine, and the doped MgO crystal is used as the evaporation source. After the crucible 10 is installed in the furnace, Open the high vacuum valve 11 to evacuate the vacuum degree in the evaporation chamber 8 to 8×10 -5 Pa~5×10 -4 Pa, at the same time, use the heating device 12 to heat the temperature in the furnace to 300°C, and cool down to 250°C after reaching the requirements; secondly, make the glass substrates 1 and 2 rotate with the clamp 9, and a pair of electron beam evaporation guns 13 start to refine the guns, and the electron beam Start to bombard the MgO crystal target; after reaching the requirements, press the preset working oxygen partial pressure of 0.25×10 -2 Pa feeds oxygen from the oxygen port 14 and stabiliz...
Embodiment 2
[0028] As shown in Figures 1, 2, and 4.
[0029] First, the front and rear glass substrates 1, 2 of the shadow mask type color plasma display screen are placed on the working fixture 9 in the evaporation chamber 8 of the electron beam vacuum coating machine, and the doped MgO crystal is used as the evaporation source. After the crucible 10 is installed in the furnace, Open the high vacuum valve 11 to evacuate the vacuum degree in the evaporation chamber 8 to 8×10 -5 Pa~5×10 -4 Pa, at the same time use the heating device 12 to heat the temperature in the furnace to 300°C, and cool down to 250°C after reaching the requirements; then the glass substrates 1 and 2 rotate with the fixture 9, a pair of electron beam evaporation guns 13 start refining the guns, and the electron beam starts Bombard the MgO crystal target; after reaching the requirements, press the preset working oxygen partial pressure of 0.5×10 -2 Pa feeds oxygen from the oxygen port 14 and stabilizes the bombardmen...
Embodiment 3
[0033] As shown in Figures 1, 2, and 5.
[0034] First, the front and rear glass substrates 1, 2 of the shadow mask type color plasma display screen are placed on the working fixture 9 in the evaporation chamber 8 of the electron beam vacuum coating machine, and the doped MgO crystal is used as the evaporation source. After the crucible 10 is installed in the furnace, Open the high vacuum valve 11 to evacuate the vacuum degree in the evaporation chamber 8 to 8×10 -5 Pa~5×10 -4 Pa, at the same time, use the heating device 12 to heat the temperature in the furnace to 300°C, and then cool down to 250°C after reaching the requirements; then the glass substrates 1 and 2 rotate with the fixture 9, and a pair of electron beam evaporation guns 1 and 3 start refining the guns, and the electron beam Start to bombard the MgO crystal target; after reaching the requirements, press the preset working oxygen partial pressure of 0.75×10 -2 Pa feeds oxygen from the oxygen port 14 and stabili...
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