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Method for measuring electric conductivity of metal thin film under microwave band frequency

A technology of metal thin film and conductivity, which is applied in the direction of measuring devices, measuring electrical variables, measuring resistance/reactance/impedance, etc., to achieve the effect of convenient measurement, less to be measured, and a single source of error

Inactive Publication Date: 2008-12-17
NANJING UNIV
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The measurement range is mainly DC, low frequency and infrared bands, and there is no public report on the measurement of the conductivity of metal thin films at microwave band frequencies

Method used

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  • Method for measuring electric conductivity of metal thin film under microwave band frequency
  • Method for measuring electric conductivity of metal thin film under microwave band frequency
  • Method for measuring electric conductivity of metal thin film under microwave band frequency

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Embodiment Construction

[0020] see Figure 1-Figure 6 Shown, the concrete steps of the measuring method of electrical conductivity of metal thin film of the present invention under the microwave band frequency are as follows:

[0021] 1. Provide a vector network analyzer 1 capable of transmitting microwave band frequency signals, a rectangular empty waveguide 4 and a movable short circuit 2 provided with a piston (not shown), and connect them;

[0022] 2. Provide a substrate (not shown) and place it between the rectangular empty waveguide 4 and the movable short circuit 2, and adjust the movable short circuit 2 while observing the Smith Chart of the vector network analyzer. until the reflection coefficient of the substrate surface is 1 or a pure real number, write down the measurement position of the piston of the movable short circuit 2, and take out the substrate;

[0023] 3. Make a metal thin film sample 3, this metal thin film sample 3 comprises metal thin film (not shown) and the substrate laye...

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Abstract

The invention discloses a method for measuring the electrical conductivity of a metal film under the microwave frequency, and the steps are as follows: a vector network analyzer which can emit microwave frequency signals, a rectangular air wave guide and a movable short circuit device with a piston are utilized; a substrate is arranged between the rectangular air wave guide and the movable short-circuit device, the Smith chart of the vector network analyzer is observed, the piston of the movable short-circuit device is simultaneously regulated till the reflection coefficient of the surface of the substrate is a pure real number, then the measurement position of the piston of the movable short-circuit device is recorded and the substrate is taken out; a metal film sample which comprises the metal film to be measured and a substrate layer with the same material with the substrate is produced; the metal film sample is arranged between the rectangular air wave guide and the movable short-circuit device, thereby allowing the metal film layer to face to one end of the vector network analyzer which emits the frequency signals, the piston of the movable short-circuit device is regulated to the measurement position, and the reflection coefficient of the surface of the metal film sample is read; and the electrical conductivity of the metal film is calculated.

Description

【Technical field】 [0001] The invention relates to a method for measuring the electrical conductivity of a thin film, in particular to a method for measuring the electrical conductivity of a metal thin film at a microwave band frequency. 【Background technique】 [0002] At present, the known methods for measuring the conductivity of thin films mainly include the four-electrode method, the transmission transmission coefficient method, and the like. The measurement ranges are mainly DC, low frequency and infrared bands, and there is no public report on the measurement of the conductivity of metal thin films at microwave band frequencies. [0003] Therefore, it is necessary to provide a method for measuring the conductivity of metal thin films at microwave frequencies. 【Content of invention】 [0004] The purpose of the present invention is to provide a method for measuring the conductivity of a metal thin film at microwave frequency. [0005] The concrete steps of the method ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R27/02
Inventor 蒲殷伍瑞新
Owner NANJING UNIV
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