Thermopile infrared detection device

A detection device, infrared technology, applied in the direction of measuring devices, electric radiation detectors, photometry, etc., can solve the problems of increased man-hours and high costs
CN101363757AInactive Publication Date: 2009-02-11NIPPON CERAMIC CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
NIPPON CERAMIC CO LTD
Publication Date
2009-02-11
Estimated Expiration
Not applicable · inactive patent

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Abstract

As extraneous interference counter measure, selective vapor deposition coating with infrared permeation area is needed to apply to surface of a non-coating silicon plane-convex lens for a thermal reactor type infrared detecting device applied with optical design of the non-coating silicon plane-convex lens. But the working procedure of applying vapor deposition coating needs respectively to execute vapor deposition coating for lens, wherein problems of improved work hour, effected rate of finished products of vapor deposition coating on lens curve, and high cost are existed. The invention composed of thermal reactor type infrared detecting device applied with optical design of combination of the non-coating silicon plane-convex lens and a selective plane optical filter with infrared permeation area. Moreover, vapor deposition coating is applied integrally in slice state through plane optical filter as another component combination, not the non-coating silicon plane-convex lens, such that effectively cutting into arbitrary sizes can be carried out.
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Description

technical field

[0001] The present invention relates to a selective heat-pile infrared detection device with an infrared transmission area. Background technique

[0002] The general thermal pile type infrared detection device used in the past has an optical structure composed of non-coated silicon as a base material such as silicon that does not have the selectivity of the infrared transmission region, or the surface of the silicon base material is deposited on the surface of the silicon base material. and other technologies apply a selective optical structure with an infrared ray transmission area of ​​the vapor deposition coating to provide.

[0003] However, when using a thermal-pile infrared detection device to obtain the detection temperature, it is necessary to design the detection element and the optical system when detecting the object, and sometimes the optical design used on a general silicon or other flat filter cannot meet the requirements. Situation that requir...

Claims

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