Maintenance method, exposure method and apparatus and device manufacturing method
A technology of exposure device and exposure method, which is applied in the field of exposure technology, component manufacturing, and exposure device, and can solve the problem that the shape of the pattern to be transferred is poor, and tiny foreign matter (particles) may adhere to the part in contact with the liquid, such as adhered to The liquid supply mechanism and the liquid flow path of the liquid recovery mechanism and other parts in contact with the liquid can be easily cleaned and the supply mechanism can be simplified.
Inactive Publication Date: 2009-03-18
NIKON CORP
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Problems solved by technology
However, in the exposure using this liquid immersion method, minute foreign matter (particles) such as photoresist residues may adhere to parts that come into contact with the liquid, such as liquids such as the liquid flow paths of the liquid supply mechanism and the liquid recovery mechanism. contact part
Such adhered foreign matter may be mixed into the liquid again during subsequent exposure and adhere to the substrate to be exposed, causing defects such as poor shape of the pattern to be transferred.
Method used
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[0149] [Description of cleaning operation in other embodiments]
[0150] Second, refer to Figure 8 Another example of embodiment of the present invention will be described. The exposure apparatus of this example basically has the same configuration as the exposure apparatus EX of FIG. 1 , but the exposure apparatus of this example is different in that the cleaning mechanism in which the cleaning nozzle member 30 is provided on the measurement stage MST side of FIG. 1 . the following, Figure 8 in, with Figure 4 and Figure 7 (A) Corresponding parts are assigned the same symbols and detailed description thereof will be omitted.
[0151] Figure 8 (A) A cross-sectional view showing the measurement table MTB of the measurement stage (see FIG. 1 ) of this example and the nozzle member 30 provided around the optical element 2 of the projection optical system PL. Figure 8 In (A), when exposure is performed by the liquid immersion method, the liquid 1 is supplied from the li...
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Abstract
Provided is a maintenance method for efficiently maintaining an exposure apparatus which performs exposure by immersion method. The method for maintaining the exposure apparatus which exposes a substrate with an exposure light through a projection optical system (PL) and a liquid (1) in an immersion area (AR2) is provided with a moving step wherein a measuring table (MTB) is arranged to face a nozzle member (30) which forms the immersion area (AR2); an accumulation step wherein the liquid (1) is supplied over the measuring table (MTB) by using a nozzle member (30), and the supplied liquid is accumulated in a cylinder section (91); and a cleaning step wherein the liquid (1) accumulated in the accumulating step is jetted through a jet nozzle section (90) to an area including at least a part of a section which has a possibility of making contact with the liquid (1) during exposure by the immersion method.
Description
technical field [0001] The present invention relates to a maintenance technology of an exposure device for exposing a substrate with exposure light through a liquid, and an exposure technology and device manufacturing technology using the maintenance technology. Background technique [0002] Micro-components (electronic components) such as semiconductor components and liquid crystal display components are transferred to substrates such as wafers coated with photosensitive materials such as photoresists by using the so-called lithography process to transfer patterns formed on photomasks such as reticles. law to manufacture. In this lithography manufacturing process, in order to transfer the pattern on the photomask to the substrate through the projection optical system, a reduction projection type exposure device (so-called stepper, stepper) using a step & repeat method is used. , and a step-and-scan (step & scan) system reduction projection type exposure device (so-called s...
Claims
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IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/70341G03F7/70975G03F7/70716G03F7/70925G03F7/2041
Inventor 依田安史
Owner NIKON CORP