Zinc oxide doped air-sensitive film preparation method
A technology of doping gas and zinc oxide, applied in measuring devices, instruments, material analysis by electromagnetic means, etc., to achieve the effects of stable structure, improved stability and accurate thickness
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0015] On the FJL560D2 three-chamber ultra-high vacuum magnetron and ion beam multifunctional sputtering coating equipment, the tubular alumina ceramic tube is used as the base, and the rotating coating auxiliary device is used to keep it rotating at a constant speed. The rotation speed is 40 revolutions per minute and the purity is 99.99 % metal zinc target, the background vacuum is less than 4.0×10-4Pa, the sputtering gas is high-purity argon, the sputtering pressure is 0.5Pa, the sputtering power is 40W, the DC magnetron sputtering is 10min, and the deposited film is transferred to the air resistance furnace Oxidize at 400°C for 60 minutes to obtain a zinc oxide film. Using a static gas sensor test device, the side-heated gas sensor made of the obtained zinc oxide film can accurately monitor 5ppm of absolute ethanol when the heating power is 1.6W. .
Embodiment 2
[0017] On the FJL560D2 three-chamber ultra-high vacuum magnetron and ion beam multifunctional sputtering coating equipment, the tubular alumina ceramic tube is used as the base, and the rotating coating auxiliary device is used to keep it rotating at a constant speed. The rotation speed is 40 revolutions per minute and the purity is 99.99 % metal zinc as the target matrix, and three pieces of pure metal indium with a purity of 99.9% are evenly distributed in the sputtering etching area to form a composite target. The background vacuum is less than 4.0×10-4Pa, and the sputtering gas is high-purity argon , sputtering pressure 0.5Pa, sputtering power 40W, DC magnetron sputtering 80min, transfer the deposited film to an air resistance furnace and oxidize it at 800°C for 10 minutes to obtain a zinc oxide doped film, using a static gas sensor test device, with A side-heated gas sensor made of zinc oxide film was obtained, which can accurately monitor 5ppm absolute ethanol when the he...
Embodiment 3
[0019] On the FJL560D2 three-chamber ultra-high vacuum magnetron and ion beam multifunctional sputtering coating equipment, the tubular alumina ceramic tube is used as the base, and the rotating coating auxiliary device is used to keep it rotating at a constant speed. The rotation speed is 40 revolutions per minute and the purity is 99.99 % metal zinc as the target matrix, and three pieces of titanium oxide with a content of 99.9% are evenly distributed in the sputtering etching area to form a composite target. The background vacuum is less than 4.0×10-4Pa, and the sputtering gas is high-purity argon. The sputtering pressure was 0.5Pa, the sputtering power was 40W, and the radio frequency magnetron sputtering was performed for 10 minutes. The deposited film was transferred to an air resistance furnace and oxidized at 1000°C for 5 minutes to obtain a zinc oxide doped film.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap