Wafer grade reliability parallel test method for field effect tube negative temperature instability
A field effect tube and instability technology, which is applied in the WLR parallel test field of field effect tube negative temperature instability, can solve the problems of sample scrapping, long measurement delay time, and being easily affected by static electricity, etc., to reduce the impact of static electricity , reduce the measurement time, the effect of rapid measurement
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[0017] The present invention has adopted the test method of WLR when carrying out negative temperature instability test, and has made further improvement to it, as Figure 4 As shown, the ground terminals B of the 8 FETs are all connected to the same measurement unit through the probe card, and the sources S of two adjacent FETs can be connected together, and are connected together through the probe card. On the same measurement unit, the other ports D and G of the FET are connected to the measurement unit through probes, so that the saturation current of 8 FETs can be tested at the same time on each cutting line. Reduce measurement time as much as possible.
[0018] It can be concluded from the measurement that when 8 field effect transistors are connected to each cutting line, the measurement time can be reduced to 1ms, so when the applied voltages are 1.32V, 1.4V, 1.5V, 1.6V, 1.8V , 2.0V, 2.2V and 2.4V, the saturation current diagram of 8 FETs is as follows Figure 5 As s...
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