Method of replacing dispersion medium
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- MITSUBISHI GAS CHEM CO INC
- Publication Date
- 2009-07-01
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a method for replacing the first dispersion medium in the raw slurry containing the first dispersion medium and terephthalic acid crystals with the second dispersion medium. More specifically, it relates to the raw slurry containing the first dispersion medium and terephthalic acid crystals obtained through liquid-phase oxidation reaction or obtained through catalytic hydrogenation treatment or recrystallization treatment of crude terephthalic acid, which contains many impurities A dispersion medium replacement method in which the first dispersion medium is efficiently replaced by the second dispersion medium, and this method is suitable for the preparation of high-purity terephthalic acid. Background technique
[0002] Terephthalic acid is produced by liquid-phase oxidation of p-phenylene compounds such as p-alkylbenzene represented by p-xylene. Usually using acetic acid as a solvent, in the presence of a catalyst suc...