Vacuum arc plasma evaporation inonization source for non-arc spot

A plasma and vacuum arc technology, applied in the field of plasma, can solve problems such as arc spots

Inactive Publication Date: 2009-07-08
王殿儒
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0017] Vacuum arc evaporation is adopted, but in the case of arc spots, it is inevitable that droplets will b

Method used

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  • Vacuum arc plasma evaporation inonization source for non-arc spot

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Embodiment Construction

[0084] According to the vacuum arc plasma evaporation ionization source without arc spot of the present invention, taking the cylindrical cathode with a circular cross section as an example, it has been tested in our company's laboratory, and it is confirmed that there is no arc spot after the actual measurement of the plating process and results. , No droplets.

[0085] The first batch of 9 evaporation sources of this kind has been put into production, and they are used to assemble the environment-friendly TGN-JKDD9 ion coating machine. After the machine is put into the market in batches, it will gradually replace the existing traditional electroplating production with serious environmental pollution.

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Abstract

The invention provides a conus vacuum arc plasma body vaporizing ionization source. In the range of a vacuum degree of 10-10 3 Pa and under an atmosphere of various airs, a cylindrical cathode with a circular section is adopted, auxiliary anodes are positioned around the cathode, under the condition that a direct working current of 100-2000A and a working voltage of 10-40 V are continuous-adjustable, conus vacuum arc can be realized on the cathode section, therefore, metallic vapour plasma bodies with liquid drop-free, high ionization degree and high-density can be produced.

Description

technical field [0001] The invention is a vacuum arc plasma evaporation ionization source without arc spots, belonging to the technical field of vacuum arc plasma. But it is mainly used in the field of physical vapor deposition (PVD) coating. [0002] This kind of evaporative ionization source belongs to the cathodic arc evaporation deposition technology. Because there is no arc spot, it can produce no liquid droplets, high ionization degree, and high density metal vapor plasma. It is generally suitable for evaporating metal materials with a boiling point above 1500°K, such as Zr, Ni, Cr, Ti, etc., according to http: / / www.lenntech.com / Periodic-Chart-elements / boiling-poi nt.htm Download and convert to absolute temperature °K, then their boiling points are as follows: Zr: 4650°K, Ni: 3005°K, Cr: 2945°K, Ti: 3560°K. Background technique [0003] The invention adopts the vacuum arc plasma technology to realize the vacuum arc discharge without arc spot, generate the metal vap...

Claims

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Application Information

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IPC IPC(8): C23C14/26C23C14/24C23C14/32
Inventor 王殿儒
Owner 王殿儒
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