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Developing machine

A developing machine and time-delay relay technology, which is applied in the field of developing machines, can solve the problems of high cost, remaining drops, expensive nozzles, etc., and achieve the effects of improved quality and pass rate, low cost, and wide application range

Inactive Publication Date: 2009-08-26
深圳深爱半导体股份有限公司
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  • Abstract
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AI Technical Summary

Problems solved by technology

The developing machine has always had the problem of residual drops, so that there will be residual liquid of developer or rinse solution on the surface of the silicon wafer, seriously affecting product quality and even product rework and other adverse problems
[0003] The solution to the above-mentioned problems in the prior art is generally to purchase high-precision nozzles. Although the effect is good, the nozzles are expensive
[0004] To sum up, the above three types of developing machines have the problem of residual dripping or high cost, which needs to be improved.

Method used

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Embodiment Construction

[0024] The technical scheme of the utility model is described in detail below in conjunction with specific embodiments and accompanying drawings.

[0025] Under normal circumstances, the developing machine sprays the developer first and then the rinse solution or sprays out at the same time. The time of the two is adjustable, and the liquid can only be sprayed out within the specified time. If it exceeds the specified time, it is defined as residual drops.

[0026] At least two connection holes and one nozzle are arranged on the nozzle of the developing machine. Such as figure 1 As shown, the overall shape of the nozzle is a long cylinder, the upper part is slightly larger than the lower part, and the A port is a connecting hole, that is, the liquid inlet, which is a liquid inlet pipe with a diameter of about 4mm; the B port is a connecting hole, That is, the air inlet, which is also 4mm in diameter; the C port is a nozzle, which is a very narrow and long port with a width of...

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Abstract

The invention discloses a developing machine, which is provided with a control device capable of delaying the time for gas of a spray nozzle. The developing machine stops after the time delay for a period of time; and during liquid spraying, a time relay works to control an electromagnetic valve to open the gas, and the gas is closed with time delay when the liquid spraying stops. Because the time delay of the time relay is adjustable and can change with the changes of a procedure, the liquid spraying effect of the spray nozzle reaches the optimum. The developing machine not only has less investment cost, but also solves the existing problems and improves the quality and the qualification rate of products.

Description

【Technical field】 [0001] The invention relates to semiconductor production equipment, in particular to a developing machine. 【Background technique】 [0002] The developer is used to develop and fix silicon wafers in the semiconductor process. It sprays the developer evenly on the silicon wafers. Normally, the developer is sprayed first and then the rinse solution. The time of the two is adjustable. It is sprayed out within the specified time, and it is defined as residual drops beyond the specified time. The developing machine has always had the problem of residual drops, so that there will be residual liquid of developer or rinse solution on the surface of the silicon wafer, which seriously affects the product quality and even product rework and other adverse problems. [0003] The solution to the above-mentioned problems in the prior art is generally to buy high-precision nozzles, although the effect is good like this, but the nozzles are expensive. [0004] To sum up, t...

Claims

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Application Information

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IPC IPC(8): G03F7/30H01L21/00
Inventor 尚峰余廷义
Owner 深圳深爱半导体股份有限公司
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