Developing machine

A developing machine and time-delay relay technology, which is applied in the field of developing machines, can solve the problems of high cost, remaining drops, expensive nozzles, etc., and achieve the effects of improved quality and pass rate, low cost, and wide application range

Inactive Publication Date: 2009-08-26
深圳深爱半导体股份有限公司
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The developing machine has always had the problem of residual drops, so that there will be residual liquid of developer or rinse solution on the surface of the silicon wafer, seriously affecting product quality and even product rework and other adverse problems
[0003] The solution to the

Method used

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[0024] The technical solutions of the present invention will be described in detail below with reference to specific embodiments and accompanying drawings.

[0025] The developing machine normally sprays the developer first and then the rinse liquid or at the same time. The time of the two is adjustable. The liquid can only be sprayed within the specified time, and it is defined as residual drop after the specified time.

[0026] On the nozzle of the developing machine, there are at least two connecting holes and one nozzle. like figure 1 As shown, the overall shape of the nozzle is a long cylinder, the top is slightly larger than the bottom, in which port A is a connecting hole, that is, the liquid inlet, which is about a liquid inlet pipe with a diameter of 4mm; port B is a connecting hole, That is, the air inlet, the diameter is also 4mm; the C port is the nozzle, which is a very narrow and long port, and its width is about 1mm. One is connected to a gas supply, the gas i...

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Abstract

The invention discloses a developing machine, which is provided with a control device capable of delaying the time for gas of a spray nozzle. The developing machine stops after the time delay for a period of time; and during liquid spraying, a time relay works to control an electromagnetic valve to open the gas, and the gas is closed with time delay when the liquid spraying stops. Because the time delay of the time relay is adjustable and can change with the changes of a procedure, the liquid spraying effect of the spray nozzle reaches the optimum. The developing machine not only has less investment cost, but also solves the existing problems and improves the quality and the qualification rate of products.

Description

【Technical field】 [0001] The invention relates to semiconductor production equipment, in particular to a developing machine. 【Background technique】 [0002] The developer is used to develop and fix silicon wafers in the semiconductor process. It sprays the developer evenly on the silicon wafers. Normally, the developer is sprayed first and then the rinse solution. The time of the two is adjustable. It is sprayed out within the specified time, and it is defined as residual drops beyond the specified time. The developing machine has always had the problem of residual drops, so that there will be residual liquid of developer or rinse solution on the surface of the silicon wafer, which seriously affects the product quality and even product rework and other adverse problems. [0003] The solution to the above-mentioned problems in the prior art is generally to buy high-precision nozzles, although the effect is good like this, but the nozzles are expensive. [0004] To sum up, t...

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Application Information

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IPC IPC(8): G03F7/30H01L21/00
Inventor 尚峰余廷义
Owner 深圳深爱半导体股份有限公司
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