Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Antistatic optical substrate preparation method

An optical substrate, anti-static technology, applied in the direction of optics, optical components, ion implantation plating, etc., can solve the problem of easy to absorb dust and achieve the effect of not easy to absorb dust

Active Publication Date: 2009-10-07
厦门美澜光电科技有限公司
View PDF0 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, ordinary coated optical substrates are easy to absorb dust, and there is no anti-static effect of coated optical substrates on the market.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Antistatic optical substrate preparation method
  • Antistatic optical substrate preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0017] Example: a structure such as figure 1 As shown, an antistatic optical substrate preparation method, the process is as follows: clean the substrate - put the substrate on the jig (frame for fixing the substrate) - put the jig into the vacuum machine - -Evacuate the vacuum machine to a certain condition--coating process (the specific process is as follows)--the machine is deflated--take out the substrate.

[0018] Coating process: After the substrate is cleaned, it is placed in a vacuum and pumped to 1x10 -5 Torr to 5x10 -5 In Torr’s high-vacuum machine, alternating high-refractive index film layers and low-refractive index coating layers are sequentially deposited on the substrate, and then the super waterproof coating material WR5 is evaporated and deposited on the film layer in a molecular state to form a new A film layer, and the thickness of the WR5 new film layer is 120-220nm, take out the substrate to form an antistatic optical substrate.

[0019] The at least o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses an antistatic optical substrate preparation method, pertaining to the lens coated optics manufacturing technology. The method includes: cleaning the substrate and then placing in a fine vacuum machine whose vacuum degree is pumped to1*10 [-5] Torr to 5*10 [-5] Torr, depositing a film with alternated high refractivity film layer and low refractivity coating film layer in sequence on the substrate, and then evaporating a super water proof coating material WR5 and then evaporating and placing on the film layer in molecular status to form a new layer of film (wherein, the film thickness is 120-220nm), and then removing the substrate to form an antistatic optical substrate. The optical lens can play an antistatic (electrostatic isolation) role, which is not liable to adsorb dust and can remain cleanly and sanitary for a long time.

Description

technical field [0001] The invention discloses a method for preparing an antistatic optical substrate, which belongs to the technical field of lens coating optical manufacturing technology. Background technique [0002] Static electricity is an objective natural phenomenon, which can be produced in many ways, such as contact and friction. Static electricity is characterized by high voltage, low power, small current and short action time. Electrostatic discharge is the abbreviation of Electro-Static discharge. When two materials are separated, either by pressure or by frictional contact, electrons are freed from the surfaces of the materials, creating an electrostatic zone. The surface of a material with fewer electrons is positively charged, while the surface of a material with excess electrons is negatively charged. These two charged materials will attract surrounding materials with opposite charges to neutralize the charge. If the charged material is conductive, then sta...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/08C23C14/26C23C14/30C23C14/10G02B1/10G02B1/16G02B1/18
Inventor 杨敏男
Owner 厦门美澜光电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com