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Exposure system and exposure method

A technology of exposure system and light source, which is applied in the field of exposure system, can solve the problems of cost increase, non-correction, inconvenient use, etc., and achieve the effect of cost saving

Active Publication Date: 2009-10-07
KUSN INFOVISION OPTOELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

For example: In the manufacturing process of thin film transistor (TFT, Thin Film Transistor) array substrates, about 11 different masks are usually required, and corresponding to different types of products, a set of corresponding masks is required, so product development will significantly increase the cost of
In addition, if there is an error in the pattern defined on the mask, the error is also uncorrectable, which brings great inconvenience to the use

Method used

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  • Exposure system and exposure method
  • Exposure system and exposure method

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Embodiment Construction

[0020] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0021] In the embodiment of the present invention, the micro-mirror device can adjust the reflection angle for incident light, so the exposure pattern can be controlled and adjusted by adjusting the reflection angles of a plurality of micro-mirrors on the micro-mirror device.

[0022] For example, in the field of projectors, a digital light processing system (DLP, Digital Light Processing) is generally used at present. The digital light processing system uses a digital micromirror device (DMD, Digital Mirror Device) as a core component to control light beams in the digital light processing system. DMD is a micro-projection display element developed by Texas Instruments (TI, Texas Instruments). Combine below figure 1 The...

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PUM

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Abstract

The invention discloses an exposure system (10), comprising a micro-reflecting mirror device (100), an arc reflecting mirror (200), light source (300), a condenser lens (400) and a substrate (600), wherein a film (700) and a photo resist (800) are on the substrate (600) in sequence, light sent by the light source (300) irradiates onto the arc reflecting mirror (200), and forms a first reflection ray by primary reflecting, the first reflection ray forms parallel incidence ray onto the micro reflecting mirror device (100) through the condenser lens (400), forms a second reflection ray by secondary reflection, the second reflection ray is projected onto the upper surface of photo resist (800) on the film (700), exposure picture shape on upper surface of the photo resist (800) can be controiled by adjusting reflection angles of the plurality of micro-reflecting mirrors (103) on the micro-reflecting mirror device. The invention also provides a exposure method.

Description

technical field [0001] The invention relates to the technical field of photolithography technology for liquid crystal display, in particular to an exposure system and an exposure method. Background technique [0002] A liquid crystal display panel (Liquid Crystal Display panel) is an important part of a liquid crystal display device. The general manufacturing process of liquid crystal display panels is mainly based on the needs of circuit design, repeatedly performing different module operations such as film formation, plate making, etching, and photoresist stripping. After several steps, the array substrate is completed, and then another sheet with color Filter glass, liquid crystal injection, etc., to complete the production of liquid crystal display panels. Plate-making engineering generally includes processes such as smearing, exposure, and development. The key points of the plate making project are photoresist smear uniformity, adhesion, alignment accuracy control, li...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 崔宏青钟德镇
Owner KUSN INFOVISION OPTOELECTRONICS
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