Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacturing method of 2*2 single-side double-fin linear array based on square wave guide

A square waveguide and fin line technology, applied in the field of production of 2×2 single-sided double-fin line array, can solve the problems of unintuitive design process, complex mathematical operation, long design cycle, etc. The effect of cycle shortening

Active Publication Date: 2010-07-21
北京中科微投资管理有限责任公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] No matter which of the above solutions is adopted, complex mathematical operations are required and the amount of calculation is large, which will directly lead to problems such as long design cycle, low design efficiency, and unintuitive design process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of 2*2 single-side double-fin linear array based on square wave guide
  • Manufacturing method of 2*2 single-side double-fin linear array based on square wave guide
  • Manufacturing method of 2*2 single-side double-fin linear array based on square wave guide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0044] The present invention uses commercial electromagnetic field simulation software to obtain the effective dielectric propagation constants corresponding to the different slit widths of the two layers of double-fin lines in the square waveguide, and makes the simulation data into a table for easy reference, and then uses Klopfenstein theory to optimize the double-fin lines, through a cycle The iterative numerical calculation obtains the effective dielectric propagation constant corresponding to different lateral nodes of the double-fin line in the commercial calculation software. Combined with the numerical table drawn by simulation, the gap corresponding to the different lateral nodes of the double-fin line can be obta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a manufacturing method of a 2*2 single-side double-fin linear array based on square wave guide, comprising the following steps of establishing a simulation model of the 2*2 single-side double-fin linear array and carrying out simulation to the simulation model to obtain the scattering property of the 2*2 single-side double-fin linear array; applying the Klopfenstein theoryin a fin line structure, and obtaining a fin line structure with the fixed length and minimum reflection coefficient according to a numeric iteration method and obtaining effective dielectric constants corresponding to transverse nodes of the double fin lines by commercial calculation software; combining the effective dielectric constants with the scattering property, obtaining the width of fin slot corresponding to different nodes of the fin line, further obtaining a conversion curve of the fin slot of the fin line with the transverse nodes, drawing the curve by commercial drawing software and obtaining an optimized 2*2 single-side double-fin linear array based on the square wave guide. The manufacturing method effectively avoids complicate numerical calculation, adopts mature electromagnetic field simulation software and shortens design period.

Description

technical field [0001] The invention relates to the technical field of design of microwave and millimeter wave band planar transmission lines, in particular to a method for manufacturing a 2×2 single-sided double-fin line array based on a square waveguide. Background technique [0002] In various application systems of microwave and millimeter wave, such as: radar, guidance, remote sensing and communication systems, as its main component, millimeter wave solid-state power amplifier is like the "heart" of these devices, and has become the most important field of millimeter wave research research direction. [0003] Traveling wave tube amplifier (TWTA) is currently the most widely used millimeter wave power source due to its advantages of high power, broadband and high efficiency. However, TWTA itself has inherent disadvantages such as large volume, heavy weight and high cost. With the development of MMIC technology, solid-state microwave and millimeter-wave amplifiers show ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
Inventor 武锦欧阳思华刘新宇阎跃鹏
Owner 北京中科微投资管理有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com