Method for forming conducting wire on insulated heat-conducting metal substrate in a vacuum sputtering way
A metal substrate, vacuum sputtering technology, applied in conductive pattern formation, vacuum evaporation plating, printed circuit and other directions, can solve the problems of poor thermal performance, related to waste water treatment, etc., to achieve environmental protection, good thermal conductivity, process process simple effect
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[0008] see figure 1 As shown, the method for forming conductive lines by vacuum sputtering on the insulating and heat-conducting metal substrate of the present invention comprises the following steps:
[0009] Step 201: providing a metal base material, wherein the material of the metal base material is magnesium alloy (such as AZ31B) or aluminum alloy;
[0010] Step 202: Perform pretreatment on the metal substrate to clean the surface of the metal substrate, wherein the pretreatment includes degreasing, pickling, and cleaning;
[0011] Step 203: Perform hard anodic oxidation on the metal substrate to form a layer of porous film, wherein the hard anodic oxidation is carried out under the condition of direct current or pulse, and the thickness of the film is 15-25 μm;
[0012] Step 204: Post-processing the metal substrate, the post-processing includes cleaning and drying;
[0013] Step 205: Coating a layer of high thermal conductivity adhesive on the metal substrate, the high ...
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