Storage cabinet with pressure stabilization function

Abstract

The invention relates to a storage cabinet with the pressure stabilization function, in particular to a storage cabinet for preventing from forming the negative pressure inside a photomask box in the air exhaust process, and the storage cabinet comprises a frame body; at least one air inlet loop and one air outlet loop are arranged on the frame body, and one or a plurality of holding units are arranged in the frame body; each holding unit is provided with at least one air inlet valve connected with the air inlet loop and at least one pressure stabilization valve connected with the air outlet loop, and the photomask box is provided with an air valve that corresponds to the air inlet valves and the pressure stabilization valves of the holding units, wherein air current passageways of the pressure stabilization valves can be arranged inside and outside the corresponding air current passages of the air valves by a spanned way so that the pressure stabilization valves can synchronously suck and exhaust air in the inside space and the external environment of the photomask box; and the storage cabinet can prevent the inside space of the photomask box from generating negative pressure by the pressure stabilization function as the air exhaust volume is larger than the air inlet volume so as to be convenient for opening the photomask box and not to generate strong instant air current, thereby the surface of a photomask inside the photomask box can be avoided from being damaged.

Description

technical field [0001] The invention relates to a cabinet in the technical field of preventing negative pressure inside a photomask box, in particular to a storage cabinet that can prevent the photomask box from being opened due to negative pressure, and can prevent the photomask box from The photomask inside is stained due to the instantaneous strong airflow, which can effectively protect the storage cabinet with the function of stabilizing the photomask surface. Background technique [0002] In recent years, with the continuous advancement of semiconductor manufacturing technology, the size of the wafer has progressed from the early 3 o'clock, 4 o'clock, 6 o'clock, and 8 o'clock to 12 o'clock. The wire diameter has been developed to 90-45 nanometers, so the number of chips (Die) on the same wafer (Wafer) has also increased significantly, and the performance and value of the chip have also been improved. In other words, when there are different chips in the process When a ...

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Problems solved by technology

[0007] In view of the existing defects in the use of the above-mentioned existing photomask boxes, the inventor actively researches and innovates on the basis of years of rich practical experience and professional knowledge in the design and manufacture of this type of product, and cooperates with the application of theories, in order to Creating a storage cabinet with a new structure with a voltage stabilizing effect can improve the general existing photomask boxes, so as to overcome the inconvenience and trouble that the existing photomask boxes are easily caused by negative pressure after filling and exhausting. make it more practical

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