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Pressure-maintaining system applied to transplanting container

A container and voltage stabilizing technology, which is applied in the direction of photomechanical processing of originals, instruments, patterned surfaces, etc., can solve the problem of affecting the convenience of opening the photomask box, the general product does not have a suitable structure, and the process Small air volume and other issues

Inactive Publication Date: 2009-12-23
E SUN PRECISION IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, the inventor is not complacent, and still seeks to provide more perfect products to customers as his career, and then found that the circulating air flow system may be affected by the internal flow channel of the photomask box and the storage photomask during use, resulting in further progress. The phenomenon that the air volume is less than the exhaust volume will cause negative pressure between the internal space of the photomask box and the external environment, which will affect the opening convenience of the photomask box, and even cause it to be unable to be opened effectively. If such a situation occurs during internal operation, it may cause the process machine to crash or be damaged, thus affecting the process efficiency
Furthermore, when negative pressure is formed in the inner space of the photomask box, the moment it is opened, the external airflow will form a strong inward airflow, which may scratch the surface of the photomask or make particles or harmful substances It is raised by the airflow, and then adheres to the surface of the photomask, resulting in defective products in the subsequent process. Since this problem also exists in other containers in the semiconductor process, such as sealed wafer storage boxes, etc., it is indeed It is necessary to make further improvements
[0007] This shows that the above-mentioned existing transfer container obviously still has inconvenience and defects in structure and use, and needs to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but for a long time no suitable design has been developed, and the general products do not have a suitable structure to solve the above-mentioned problems. Urgent problem

Method used

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  • Pressure-maintaining system applied to transplanting container
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  • Pressure-maintaining system applied to transplanting container

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Embodiment Construction

[0054] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation and structure of the voltage stabilizing system applied to the transfer container proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. , features and their effects are described in detail below.

[0055] The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of preferred embodiments with reference to the drawings. Through the description of the specific implementation mode, when the technical means and functions adopted by the present invention to achieve the predetermined purpose can be obtained a deeper and more specific understanding, but the accompanying drawings are only for reference and description, and are not used...

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PUM

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Abstract

The invention relates to a pressure-maintaining system applied to a transplanting container, which comprises a device and at least one transfer container arranged on the device, wherein the device is provided with at least one air inlet valve connected with an air inlet loop and at least one pressure maintaining valve connected with an exhaust loop; the transfer container is provided with an air valve corresponding to the air inlet valve and the pressure maintaining valve of the device; and the pressure maintaining valve is provided with a flow passage hole communicated with an inner space of the transplanting container, and the flow passage hole can be synchronously connected with an outer space of the transplanting container, so that the device can prevent the opening of the transplanting container from being influenced by the negative pressure which is generated because the air output is larger than the air input in the inner space of the transplanting container when the device discharges the air in the transplanting container through the pressure maintaining valve, and can prevent the surfaces of objects in the transplanting container from being injured by the strong instantaneous inlet air flow generated by negative pressure opening. The pressure-maintaining system can keep the balance of internal and external air pressures for the transplanting container in the process of air inflation and prevent the opening of the transplanting container from being influenced; besides, the pressure-maintaining system can prevent the transplanting container from generating instantaneous strong air flow during opening so as to prevent the surface and the cleanliness of a wafer or a photomask.

Description

technical field [0001] The present invention relates to a voltage stabilizing system in the technical field that can ensure the balance of air pressure inside and outside the transfer container, in particular to a voltage stabilizing system applied to the transfer container that can prevent negative pressure inside the transfer container, so as to further Protect the contents inside the transfer container. Background technique [0002] Affected by the continuous development and maturity of semiconductor process technology, the size of the wafer has progressed from the early 3 o'clock, 4 o'clock, 6 o'clock, and 8 o'clock to 12 o'clock, and the wire diameter of the integrated circuit on the wafer is continuously miniaturized , its wire diameter has been developed from 0.25 microns in the early stage to 90-45 nanometers, and the electronic products are constantly developing towards the characteristics of lightness, lightness, shortness, high frequency, high performance, etc., w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F1/00H01L21/677H01L21/673H01L21/67B65D85/00
Inventor 陈俐殷蔡铭贵黄柏凯
Owner E SUN PRECISION IND
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