Adjustable bearing cleaning apparatus for processing hard surface photomask base plate and assembling method thereof

A photomask and adjustable technology, which is applied in the field of optical glass processing and hard-surface photomask substrate manufacturing, can solve the problems of brittle material workpiece damage, affecting cleaning effect, blocking water flow, etc., so that it is not easy to damage the workpiece and has good versatility , Increase the effect of water contact

Inactive Publication Date: 2010-01-20
华东建筑集团股份有限公司
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

First of all, in order to ensure the solidity requirements of the appliance itself, engineering plastics with a certain hardness are generally selected, and improper operation may easily cause damage to the brittle material workpiece
Secondly, the structure of the basket-type load-bearing cleaning rack, especially the reinforcing ribs, will block the water flow and affect the cleaning effect
In addition, the slot width of the basket-type loading and cleaning rack is fixed, and different specifications of hard-surface photomask substrates need to use different specifications of loading and cleaning racks, which has poor versatility

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Adjustable bearing cleaning apparatus for processing hard surface photomask base plate and assembling method thereof
  • Adjustable bearing cleaning apparatus for processing hard surface photomask base plate and assembling method thereof
  • Adjustable bearing cleaning apparatus for processing hard surface photomask base plate and assembling method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The structure and assembly method of the cleaning appliance of the present invention will be described below by taking the cleaning of 2.5-inch and 3.5-inch hard-surface photomask substrates as an example. Please refer to Figures 5 and 6 together. The specification of the 2.5-inch hard-surface photomask substrate is 63.5 mm×63.5mm×3.05mm, the size of the 3.5-inch hard-surface photomask substrate is 88.9mm×88.9mm×3.8mm.

[0025] Step 1. Fix the 1# notch frame a1 to the ends of the two guiding and positioning rods a2 passing through the two end guiding and positioning holes k1 with the positioning screw b6, and the guiding rod a3 passes through the middle positioning hole k5. refer to Figure 5-1 .

[0026] Step 2, 2# notch frame a1 and 1# notch frame a1 are parallel and juxtaposed in the same direction, and the two guide positioning rods a2 and guide rod a3 pass through the corresponding end guide positioning hole k1 of 2# notch frame a1 and the middle positioning hole...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of hard surface photomask base plate manufacture and the field of optical glass finishing, in particular to a bearing cleaning apparatus and an assembling method applied to the process of manufacturing a hard surface photomask base plate. The bearing cleaning apparatus is manufactured by assembling a notch frame (a1) and guiding positioning rods (a2), wherein the notch frame (a1) is formed by positioning and connecting a notch plate (b1) and a rib plate (b3) through a fixing piece, and the left side and the right side of the notch plate (b1) are provided with a mirror symmetrical slot (c1) and a bottom strip slot (c2) vertically running through the symmetrical slot (c1); and the ends of the left side and the right side of the notch plate (b1) are provided with guide holes (k1) for positioning and mounting the guide positioning rods (a2). The bearing cleaning apparatus has good universality and is flexible and convenient, the whole body is difficult to deform, the phenomenon of water flow blockage cannot appear in the cleaning process, and the cleanliness and the operation efficacy of workpieces can be improved effectively.

Description

Technical field: [0001] The invention relates to the field of hard-surface photomask substrate manufacturing and the field of optical glass processing, in particular to a carrying cleaning tool used in the hard-surface photomask substrate manufacturing process. technical background: [0002] According to the national hard-surface photomask substrate standard, there are 7 series of standard length and width specifications for hard-surface photomask substrates, and 6 series of standard thickness specifications. These products of different specifications have to go through cutting, grinding, polishing and cleaning processes. Carrying cleaning equipment during the production process has a key impact on simplifying process operations, reducing damage to brittle materials, and improving cleaning efficiency. [0003] In the prior art, the hard surface photomask substrate carrying cleaning device adopts a basket structure, such as figure 1 shown. There are some problems in the act...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00C03B19/00C03B23/00G03F1/60G03F1/82
Inventor 袁克文
Owner 华东建筑集团股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap